Infrared laser spectrum trace water vapor detection system and its detection method
A detection method, infrared laser technology, applied in the direction of color/spectral characteristic measurement, measuring device, material analysis through optical means, etc., can solve the problems of trace water vapor detection interference, measurement accuracy limitation, trace water vapor measurement influence, etc. Achieve the effects of eliminating influence, highly sensitive detection, and suppressing common mode noise
Active Publication Date: 2018-01-12
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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However, the infrared laser spectroscopy technology based on single-line analysis requires an isolated spectral line for water vapor that is not interfered by background gas components. Usually, this requirement is easier to meet under detection conditions, but under high-concentration background gas, weak background gas molecular absorption lines It will also cause interference to the detection of trace water vapor, especially for NH3 and SO2, which have high spectral line density in the near-infrared spectral region of water vapor spectral detection as background gases, and the measurement accuracy is greatly limited
At the same time, water vapor is also the main component of the ambient atmosphere. Limited by the design of the optical path, the interference of water vapor in the detection optical path outside the sample area will also affect the application of infrared laser spectroscopy to the measurement of trace water vapor in industrial high-purity gases.
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[0032] Such as figure 1 As shown, an infrared laser spectrum trace water vapor detection system includes an infrared semiconductor laser 1, and the light beam emitted by the infrared semiconductor laser 1 is split into a detection light and a reference light with a light intensity ratio of 1:1 by a beam splitter 4 , the detection light and the reference light are respectively incident on the detection absorption cell 8 and the reference absorption cell 17, the detection absorption cell 8 and the reference absorption cell 17 are two multiple reflection optical absorption cells with the same optical path, the detection absorption The pool 8 is provided with an air inlet 7 and an air outlet 9, and the detection sample gas enters the absorption pool through the air inlet 7, and flows out through the air outlet 9, and the reference absorption pool 17 is sealed with a background of an atmospheric pressure and the detection sampler. For high-purity standard gases of the same gas type...
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The invention belongs to the technical field of gas concentration detection, and concretely relates to an infrared laser spectrum system for detecting a trace quantity of water steam, and a detection method thereof. A double-absorption cell structure is adopted, influences of high-concentration gas background gas spectrum and absorption cell external environment water steam are eliminated through spectrum signal differential cancellation of a detection light path and a reference light path, and common-mode noises of a light system are inhibited, so high-sensitive detection of the trace quantity of water steam in a high-concentration industrial gas is realized.
Description
technical field [0001] The invention belongs to the technical field of gas concentration detection, and in particular relates to an infrared laser spectrum trace water vapor detection system and a detection method thereof. Background technique [0002] Industrial processes often involve high-concentration process gases, such as high-concentration SO2 gas in the acid production process in the metallurgical industry, high-purity NH3 gas in the semiconductor industry, etc. In order to ensure product quality and equipment safety, it is necessary to improve the gas purity as much as possible and reduce the content of impurity components. Water vapor is the most common impurity gas. For example, water vapor impurities in high-concentration SO2 gas in the acid production process will cause catalyst failure and corrosion of pipeline equipment. Water vapor impurities in high-purity NH3 gas in the semiconductor industry will affect the optoelectronics of semiconductors and reduce the q...
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IPC IPC(8): G01N21/01G01N21/39
Inventor 张玉钧高彦伟陈东何莹尤坤高闽光李宏斌高乾坤王立明刘文清刘建国
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI