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Manufacturing method for composite magnetic mask plate for evaporation

A composite magnetic and manufacturing method technology, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of not meeting the high-quality evaporation process, drooping board surface, limiting the resolution of OLED products, etc.

Inactive Publication Date: 2016-01-06
KUN SHAN POWER STENCIL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

figure 2 shown as figure 1 The enlarged schematic diagram of the cross-section in the A-A direction in the figure, 20 is the mask part, and 21 is the mask opening when the organic material is evaporated. Since the mask plate 11 is generally made of a metal sheet through an etching process, it constitutes the mask of the mask pattern (10). The size of the mold part (20) and the opening (21) will be limited by the thickness h of the metal sheet itself (h is generally greater than 30 μm) and the process, thereby limiting the resolution of the final OLED product; in other words, the width of the opening (21) It is difficult to make the size d1 smaller (at present, openings with d1 less than 30um are very difficult to make), even if it can be made small, openings with a large aspect ratio cannot meet the high-quality evaporation process
In addition, if a large-sized mask is produced, the metal-type mask body 11 will have a relatively large mass, which will cause the surface of the mask body 11 to sag (that is, a concave phenomenon will appear in the middle of the surface), which will affect the accuracy. The higher mask evaporation process is detrimental

Method used

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  • Manufacturing method for composite magnetic mask plate for evaporation
  • Manufacturing method for composite magnetic mask plate for evaporation
  • Manufacturing method for composite magnetic mask plate for evaporation

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Experimental program
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Effect test

Embodiment 1

[0058] combine Figure 4 , Embodiment 1 of the present invention is expanded as follows:

[0059] S1. The metal support layer is produced by electroforming, and the metal support layer 41 with a certain thickness is produced. The metal support layer 41 is provided with a specific window structure 410. The metal support layer 41 is produced by electroforming. The specific electroforming process includes: S11, substrate preparation, select an electroformed deposition substrate 40 with a clean and flat surface; S12, film sticking, press or coat a layer of photosensitive film on one surface of the deposition substrate 40 to form a photosensitive film layer 400; S13, exposure, for S12 The specific area of ​​the photosensitive film layer 400 is exposed, and the area 401 where the photosensitive film layer is exposed is the area where the window structure 410 is located, and the photosensitive film in other areas 402 outside the window structure 410 is not exposed; S14, development, ...

Embodiment 2

[0074] As a second embodiment of the present invention, such as Figure 5 As shown, the difference from Embodiment 1 is that in Embodiment 1, each window structure 410 on the metal support layer 41 has only one opening structure 420 inside; while in this embodiment, each window structure 410 has multiple opening structures inside. Opening structure 420 .

Embodiment 3

[0076] As a third embodiment of the present invention, such as Image 6 As shown, it is different from Embodiments 1 and 2 in that the "stripping step" in Embodiments 1 and 2 is carried out after the electroforming process is completed (that is, it is completed before the step S2 of covering the surface of the metal support layer); In this embodiment, the "stripping step" (as step S5 ) is after the step of developing the photoresist film layer in S4 . Such a design method can better avoid damages such as creases on the metal support layer 41 with a thinner thickness during the mask making process.

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Abstract

The invention discloses a manufacturing method for a composite magnetic mask plate for evaporation. The manufacturing method is completely different from an existing method for manufacturing a mask plate through an etching technology. The manufacturing method comprises the steps that firstly, a metal supporting layer is manufactured in an electroforming manner; secondly, the surface of the metal supporting layer is covered with a film; thirdly, exposure of a photoresist film layer is conducted; and fourthly, developing of the photoresist film layer is conducted. According to the magnetic mask plate manufactured through the manufacturing method, an organic mask layer of the mask plate can be made to be very thin, the width of an opening is further made to be smaller, and therefore the final magnetic mask plate can be used for evaporating OLED products with higher resolutions, and meanwhile the feature of high precision of electroforming is achieved.

Description

technical field [0001] The invention belongs to the display panel industry, and relates to a mask plate for evaporation used in the production process of an OLED display panel, in particular to a method for manufacturing a magnetic mask plate for evaporation. Background technique [0002] Because organic light-emitting diodes (Organic Light-Emitting Diode, OLED) have self-illumination at the same time, no backlight is required, high contrast, thin thickness, wide viewing angle, fast response speed, can be used for flexible panels, wide operating temperature range, structure It is considered to be the next-generation flat-panel display emerging application technology due to its excellent characteristics such as simple manufacturing process. [0003] The most important part in the OLED production process is to deposit the organic layer on the substrate according to the requirements of the drive matrix to form the key light-emitting display unit. OLED is a solid material, and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04
CPCC23C14/04
Inventor 魏志凌
Owner KUN SHAN POWER STENCIL