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Manufacturing method for nuclear track etched membrane with single taper micropore

A technology of nuclear track etching and manufacturing method, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve the problems of difficult operation, unsuitable for mass production, and difficult to control single-cone micropores, etc. Achieve the effect of low cost, easy implementation and simple process

Inactive Publication Date: 2016-01-13
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: 1. It is not easy to control the diameters D1 and D2 of the single tapered micropore; 2. Due to the need to isolate the two etching solutions, it is difficult to operate and can only be produced in a small amount in the laboratory, which is not suitable for mass production

Method used

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  • Manufacturing method for nuclear track etched membrane with single taper micropore
  • Manufacturing method for nuclear track etched membrane with single taper micropore
  • Manufacturing method for nuclear track etched membrane with single taper micropore

Examples

Experimental program
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Effect test

Embodiment 1

[0024] This embodiment is used to illustrate the manufacturing method of the nuclear track etching film with a single tapered micropore provided by the present invention. Specific steps are as follows:

[0025] Making a double-layer film: superimposing two polyester films of the same size with a thickness of 25 μm to obtain a double-layer film;

[0026] Irradiation: On the tandem accelerator of the China Institute of Atomic Energy, a sulfur ion beam with an energy of 80-500 MeV is generated, the beam intensity is 0.1nA-1mA, and the irradiation time is 0.1-0.8 seconds on the double-layer film. The latent track density formed on the bilayer film after irradiation is 2×10 5 / cm 2 ;

[0027] Etching: Put the irradiated double-layer film into NaOH aqueous solution with a concentration of 6mol / L for etching, the etching time is 35min, and the etching temperature is 70°C;

[0028] Cleaning: use a weak acid solution (pH 2, the same below) and pure water to clean the etched double-...

Embodiment 2

[0033] This embodiment is used to illustrate the manufacturing method of the nuclear track etching film with a single tapered micropore provided by the present invention. Specific steps are as follows:

[0034] Making a double-layer film: superimpose two polypropylene films of the same size with a thickness of 18 μm to obtain a double-layer film;

[0035] Irradiation: The double-layer film was irradiated as in Example 1, and the latent track density formed on the double-layer film after irradiation was 3×10 5 / cm 2 ;

[0036] Etching: put the irradiated bilayer film in H2 with a concentration of 6mol / L 2 SO 4 solution and 0.8mol / L potassium dichromate solution for etching, the etching time is 35min, and the etching temperature is 70°C;

[0037] Cleaning: use weak acid solution and electro-pure water to clean the etched double-layer film;

[0038] Drying: Dry the cleaned double-layer film in an oven at a temperature of 70°C;

[0039] Separation of the double-layer membra...

Embodiment 3

[0042] This embodiment is used to illustrate the manufacturing method of the nuclear track etching film with a single tapered micropore provided by the present invention. Specific steps are as follows:

[0043] Making a double-layer film: superimpose two polyimide films of the same size with a thickness of 12.5 μm to obtain a double-layer film;

[0044] Irradiation: The double-layer film was irradiated as in Example 1, and the latent track density formed on the double-layer film after irradiation was 2×10 6 / cm 2 ;

[0045] Etching: put the irradiated bilayer film into KMnO with a concentration of 0.5mol / L 4 Soak in the aqueous solution for 20 minutes, and then use 1mol / L sodium hypochlorite aqueous solution for etching, the etching time is 18 minutes, and the etching temperature is 65°C;

[0046] Cleaning: use weak acid solution and high-purity water with a resistance greater than 2 megohms to clean the etched double-layer film;

[0047] Drying: Dry the cleaned double-la...

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Abstract

A related manufacturing method for a nuclear track etched membrane with a single taper micropore comprises the following steps: preparing a bilaminar membrane, concretely, combining two polymer films with same specification together, so as to obtain the bilaminar membrane; performing irradiation, concretely, irradiating the bilaminar membrane by using energetic ion generated by an accelerator, and enabling the latent track generated through irradiation to penetrate the bilaminar membrane; etching, concretely, immersing the irradiated bilaminar membrane in an etching solution for etching; drying, concretely drying the etched bilaminar membrane; separating the two layers of the films of the dried bilaminar membrane, so as to obtain the nuclear track etched membrane with the single taper micropore. The provided manufacturing method is simple in technology, easy to control and low in cost. The manufacturing method can be used to prepare the heavy ion micropore membrane possessing the single taper micropore with the small-port end section circle diameter (D1) of 0.1-15 mu m and the large end-section circle diameter (D2) of 0.2-20 mu m.

Description

technical field [0001] The invention belongs to the technical field of nuclear track etching films, and in particular relates to a manufacturing method of nuclear track etching films with single tapered micropores. Background technique [0002] Nuclear track etching membrane is a high-quality microporous membrane produced by nuclear technology. Its micropores are approximately cylindrical straight through holes with uniform pore size. It is an ideal filter membrane for precision filtration and sieving of particles. The filtration mechanism is sieving filtration. It is reusable, has strong pressure bearing capacity, high temperature resistance, good chemical and biological stability, and is currently the best precision filter material. . At present, it has been widely used in electronics, food, chemical, pharmaceutical and other industries and fields such as biology, medicine, environment, analysis and detection, and has a very broad application prospect. [0003] Generally...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D67/00B01D71/50B01D71/64B01D71/26B01D71/54B01D71/48
Inventor 吴振东梁海英焦学胜陈东风鞠薇傅元勇王雪杰
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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