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A dual-wavelength single-exposure interferometry method and system

An interferometric, dual-wavelength technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of complex and time-consuming measurement process, high requirements for environmental stability, and low precision, so as to increase the measurement range, reduce the acquisition time, Effect of maintaining measurement accuracy

Active Publication Date: 2017-11-10
SOUTH CHINA NORMAL UNIVERSITY
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Problems solved by technology

[0003] In order to overcome the technical problems of phase ambiguity, low precision, high requirements for environmental stability and complex and time-consuming measurement process in the prior art when measuring large mutation objects, the present invention provides a technology based on space carrier frequency phase shift The single-exposure dual-wavelength interferometry method only needs to collect a dual-wavelength aliasing off-axis interferogram from a single black-and-white image sensor to simultaneously extract the wrapped phase at two wavelengths, and then use the frequency difference of the two wavelengths to generate Synthetic wavelengths to achieve the measurement of larger jump objects, the invention combines the advantages of the time domain phase shift method and the Fourier transform method, while maintaining the measurement accuracy of the time domain phase shift method, it expands the measurement range and reduces the Meet the requirements of environmental stability, reduce the acquisition time, and facilitate the realization of dynamic phase measurement

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  • A dual-wavelength single-exposure interferometry method and system
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  • A dual-wavelength single-exposure interferometry method and system

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no. 1 example

[0034] This embodiment will further illustrate the single-exposure dual-wavelength interferometry system based on the spatial carrier frequency phase shift technology described in the present invention with reference to the drawings and embodiments, but this should not limit the protection scope of the present invention.

[0035] Such as figure 1 As shown, the system includes: a semiconductor-pumped solid-state laser 1 with a wavelength of 532nm and a He-Ne laser 2 with a wavelength of 632.8nm; after the two laser beams pass through the beam splitter 5 and the beam splitter 6 respectively, each Split into two beams of light, one beam of reference light and one beam of object light. After the adjustment of the plane reflector 12 and the beam splitter 7, the object light at the two wavelengths propagates in the same path, and then passes through the measured sample 17 and the reference light of the two wavelengths reflected by the plane reflectors 10 and 11 respectively. Interf...

no. 2 example

[0037] This embodiment will further illustrate the single-exposure dual-wavelength interferometry method based on the spatial carrier frequency phase shift technology described in the present invention with reference to the drawings and embodiments, but this should not limit the protection scope of the present invention.

[0038] Step 1. Collect the dual-wavelength aliasing off-axis interferogram including the spatial carrier frequency:

[0039] After the optical path system is built, use a computer to drive a monochrome black-and-white image sensor to collect a dual-wavelength aliasing off-axis interferogram, as shown in image 3 As shown, the interference signal intensity carrying linear carrier frequency information on the pixel point (x, y) can be expressed as:

[0040]

[0041] Among them, (x, y) represents the position of the pixel on the target surface, and the value ranges are 1≤x≤X and 1≤y≤Y respectively, and X and Y are the number of rows and columns of the dual-w...

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Abstract

The present invention provides a dual-wavelength single-exposure interferometry method and system based on spatial carrier frequency phase shift. A monochrome black-and-white image sensor is used to record a dual-wavelength aliasing off-axis interferogram including spatial carrier frequency, and then the One of the interferograms is converted into multiple dual-wavelength phase-shifted sub-interferograms, and then the least squares phase extraction algorithm is used to simultaneously obtain two wrapped phases at a single wavelength, and then a simple subtraction operation can be used to obtain the composite wavelength lower phase. The feature of the present invention is that it proposes a large-scale single-exposure interferometry method. This measurement method has a simple device, but is stable and reliable, and has high precision. The most obvious advantage is that only one interferogram needs to be collected to realize two The phase shift under the wavelength expands the application field of the phase shift method, and it has a good application prospect in preventing environmental interference or dynamic phase measurement in phase measurement.

Description

technical field [0001] The invention relates to the field of optical interferometry or digital holography, in particular to a method and system for single-exposure dual-wavelength interferometry based on space carrier frequency phase shift technology. Background technique [0002] Optical interferometry technology uses the interference principle of light to record the phase information of the object to be measured in the form of interference fringes, and the phase of the object to be measured can be obtained by processing the interference fringes. Usually the use of single-wavelength measurement technology will encounter the problem of phase ambiguity caused by the fluctuation of the object to be measured beyond the measurement wavelength. The use of dual-wavelength measurement technology can generate a synthetic wavelength (equivalent wavelength) that is much larger than the original wavelength. , so as to avoid the problem of understanding the phase wrapping, and can reali...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/021
Inventor 钟丽云黄林波吕晓旭熊佳翔刘胜德
Owner SOUTH CHINA NORMAL UNIVERSITY
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