Palladium electroplating solution containing tetraphenylarsonium bromide and electroplating method of palladium electroplating solution
A technology of tetraphenyl arsenium bromide and diamino palladium dibromide is applied in the field of palladium electroplating solution containing tetraphenyl arsenium bromide, and can solve the problem of wire adhesion and solder wettability decrease, palladium plating layer The thickness is difficult to control and the current efficiency of the plating solution is low, so as to achieve the effect of good coating quality, excellent plating solution performance and high cathode current efficiency
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Embodiment 1
[0029] The formulation of the electroplating solution is as follows:
[0030]
[0031] Plating process conditions: the pulse width of the single pulse square wave current is 2ms, the duty cycle is 30%, and the average current density is 2A / dm 2 ; The pH is 7.5, the temperature is 45°C, and the electroplating time is 9 minutes.
Embodiment 2
[0033] The formulation of the electroplating solution is as follows:
[0034]
[0035] Plating process conditions: the pulse width of single pulse square wave current is 0.6ms, the duty cycle is 25%, and the average current density is 2.5A / dm 2 ; The pH is 7.5, the temperature is 45°C, and the electroplating time is 5min.
Embodiment 3
[0037] The formulation of the electroplating solution is as follows:
[0038]
[0039] Plating process conditions: the pulse width of single pulse square wave current is 0.8ms, the duty cycle is 20%, and the average current density is 3A / dm 2 ; The pH is 8.5, the temperature is 55°C, and the electroplating time is 6 minutes.
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