Wave-aberration indoor detection method of large-caliber photoelectric detection system at different elevations

A photoelectric detection and detection method technology, which is applied in the direction of optical instrument testing, measuring devices, and testing optical performance, etc., can solve the problems of medium and high frequency part measurement error, instrument volume, weight increase, and tilt error are difficult to control, and achieve accuracy and repeatability High performance, improve measurement accuracy, increase the effect of sampling density

Active Publication Date: 2016-05-11
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF4 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the above-mentioned sub-aperture slope sampling measurement principle is limited by the sampling density and system configuration, and it still cannot completely replace the full-aperture interferometric detection or outdoor star detection. Its current main limitations include:
[0004] (1) It is difficult to control the tilt error in the sub-aperture scanning process. Most of the current technical ideas passively reduce the error by improving the motion accuracy and positioning accuracy of the mechanical scanning system.
As a result, the size and weight of the instrument have increased significantly
However, limited by the cumulative sampling error caused by this, it is difficult to increase the sub-aperture sampling density, and the suppression residual of the sub-aperture tilt error still does not meet the accuracy requirements of wavefront reconstruction.
[0005] (2) During the sub-aperture scanning process, due to the influence of environmental errors such as airflow disturbance and non-equal-phase vibration, there are random measurement errors in the sub-aperture slope, which is equivalent to adding a random error background to the final reconstructed wavefront. The middle and high frequency parts in the previous information bring large measurement errors
[0006] (3) In order to ensure the scanning accuracy, most of the current measurement devices are bulky and heavy, and it is not easy to use them at different elevation angles, and their flexibility and applicability are poor.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wave-aberration indoor detection method of large-caliber photoelectric detection system at different elevations
  • Wave-aberration indoor detection method of large-caliber photoelectric detection system at different elevations
  • Wave-aberration indoor detection method of large-caliber photoelectric detection system at different elevations

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0055] The indoor detection method of the wave aberration under different elevation angles of the large-aperture photoelectric detection system of the present invention specifically proposes: (1) adopting a polygonal mirror scanning system to realize the technical scheme of sub-aperture scanning; (2) improving the sub-aperture absolute slope measurement to relative slope measurement (3) design an integrated sub-aperture two-dimensional tilt error monitoring optical path; (4) the present invention can also effectively realize the light weight of the measuring equipment, and based on this, it is proposed that the testing equipment and the photoelectric detection system to be tested are fixedly connected and used to utilize Its pitch axis system provides technical solutions for different elevation angles. At present, we have developed a principle verification test device, and have actually verified the effectiveness of the above-mentioned content of the invention through experimen...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a wave-aberration indoor detection method of a large-caliber photoelectric detection system at different elevations. An objective target plate and illumination system, a small-caliber collimating optical system with a variable diaphragm, a first turning beam-splitting prism, a second turning beam-splitting prism, a measuring head third turning beam-splitting prism, a measuring head first beam-splitting prism, a second beam-splitting prism, a first photoelectric auto-collimator, a third beam-splitting prism and a second photoelectric auto-collimator are successively arranged on a detection optical path. According to the technical scheme of the invention, the wave-aberration indoor detection method of the large-caliber photoelectric detection system at different elevations is mainly used for detecting the wave aberration of the large-caliber photoelectric detection system at different elevations. In this way, the imaging quality at different elevations and the stability quantitative assessment thereof are realized.

Description

technical field [0001] The invention belongs to the field of optical detection and optical measurement, in particular to an indoor detection method of wave aberration under different elevation angles of a large-diameter photoelectric detection system. Background technique [0002] With the continuous increase of the aperture of the main optical system in the ground-based photoelectric detection system, the change of the elevation angle of the large-aperture main optical system during the tracking and imaging process of the photoelectric detection system will have a greater impact on the stability of its optical performance. Relevant simulations and experiments show that when the aperture of the optical system is close to 3m, the surface shape change caused by the elevation angle changing from horizontal (0°) to zenith (90°) is about λ / 11 (RMS, λ=632.8nm), The defocus caused by the change of elevation angle exceeds 17mm, and the dynamic pointing error of the optical axis exce...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
CPCG01M11/0207
Inventor 何煦张晓辉袁理靳淳淇
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products