Method and device for treating waste gas of TFT glass substrate kiln

Abstract

The invention relates to a method and device for treating waste gas of a TFT glass substrate kiln. The device comprises a cooling tank, a dust removal box, a combustion chamber and an SCR reaction unit which are sequentially communicated; a first discharging opening for discharging mixtures and boric oxides is formed in the bottom of the cooling tank; a first waste gas inlet, a first waste gas outlet and a cooling medium inlet are formed in the cooling tank, and the first waste gas outlet is communicated with the dust removal box; a dust removal device is arranged in the dust removal box; and an air inlet, a natural gas inlet and a reducing agent inlet are formed in the combustion chamber. The method comprises the steps of firstly, removing the boric oxides in the waste gas, secondly, removing particle matter in the waste gas, thirdly, adopting a combustion manner to remove parts of the nitric oxides, and fourthly, adopting a catalytic deoxidizing reaction to remove the nitric oxides, completing treatment of the waste gas of the TFT glass substrate kiln, and performing discharging after the environment-friendly standard is achieved. The operation steps are simple, and various forms of boron and nitrogen oxides in the waste gas of the kiln can be effectively removed.

Description

【Technical field】 [0001] The invention belongs to the field of glass kiln waste gas treatment, in particular to a method and device for treating TFT glass substrate kiln waste gas. 【Background technique】 [0002] Adding B to the glass composition during the TFT glass firing process 2 o 3 As a solubilizer to lower the glassmaking temperature, but B 2 o 3 It is easy to volatilize at high temperature, and is discharged from the kiln with the exhaust gas, and condenses again at low temperature, which affects the normal operation of the smoke exhaust equipment, because B 2 o 3 The melting temperature of liquid crystal glass is 450°C, and the firing temperature of liquid crystal glass is 1500-1650°C, which will cause part B 2 o 3 of volatilization. The flue gas temperature of the glass kiln is 800-1000°C, at this time B 2 o 3 Exist in liquid form and become solid B when the flue gas temperature drops below 325°C 2 o 3 or pyroboric acid. During the cooling process of fl...

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Problems solved by technology

The denitrification efficiency of this method is low, the ability is unstable, and basically cannot meet the national standard; the urea solution is sprayed into the SNCR section, and the temperature at the bottom of the tank drops to about 650°C. At this temperature, the batch material and B in the flue gas 2 o 3 Mixed together to form lumps, causing blockage at the bottom of the SNCR tank, difficult to clean and affecting the kiln process

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