Photosensitive dry film with stable storage and preparation method of photosensitive dry film

A photosensitive dry film and dry film technology, applied in the direction of photographic platemaking process coating equipment, etc., can solve the problems of reducing production efficiency, reducing photopolymerization speed, increasing development time, etc., to block oxygen and water vapor damage, prevent cold flow, The effect of suppressing edge flow glue

Active Publication Date: 2016-06-15
HANGZHOU FIRST APPLIED MATERIAL CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

If this method is feasible, it will complicate the production process and reduce the production efficiency of enterprises
It is mentioned in the patent document US4,293,635 that by (1) reducing the amount of monomer or plasticizer in the resist, and (2) increasing the molecular weight of the resin in the resist, the cold flow tendency can be reduced and the storage time can be prolonged , but this will reduce the photopolymerization speed, prolong the exposure time, and increase the development time, reducing production efficiency

Method used

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  • Photosensitive dry film with stable storage and preparation method of photosensitive dry film
  • Photosensitive dry film with stable storage and preparation method of photosensitive dry film
  • Photosensitive dry film with stable storage and preparation method of photosensitive dry film

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Embodiment 1-3

[0029] (embodiment 1-3, comparative example 1-2)

[0030] According to the formula in Table 1 below, the components were mixed in proportion, 60 parts by weight of acetone was added, and then fully stirred until completely dissolved to form a dry film solution with a solid content of 40%. On the production line, it is evenly coated on the surface of the PET film (15um thick) as a supporting film, and the solution is dried through a drying tunnel at a temperature of about 70°C to form a dry film resist layer with a thickness of 26um. Appears green. Then, a polyethylene film as a protective layer was pasted on its surface, with a thickness of 20um, so that a photosensitive dry film master roll with a three-layer structure was obtained. It was rolled up on a 6-inch roll with a length of 3000m and a width of 1260mm. Finally, according to the cutting temperature in Table 1, the photosensitive dry film master roll was cut to obtain the final dry film product with a length of 200m ...

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Abstract

The invention provides a photosensitive dry film with stable storage and a preparation method of the photosensitive dry film. The photosensitive dry film sequentially comprises a support film layer, a resist layer and a protective film layer, wherein the support film layer is double heat-sealed PET, has a three-layer structure and comprises two copolyester PETG layers and a PET resin layer between the two copolyester PETG layers. The defect of poor heat-sealing property of a conventional PET film is overcome. Through heating and cutting, a support film, a resist and a protective film at a notch are quickly heat-sealed to form a heat-sealed layer which is 0.1-2.0mm in width, so that the resist layer can be prevented from generating a cold flow; edge gummosis is inhibited; oxygen and moisture damages are blocked; and the dry film product with stable storage is obtained. In addition, the properties of the resolution ratio and the like of the dry film are not reduced even if cutting is carried out under a heating condition.

Description

technical field [0001] The invention relates to a photosensitive dry film with a multilayer structure and a preparation method of the dry film. technical background [0002] In the fields of printed circuit board, lead frame, semiconductor package (such as ball grid array package, chip size package), metal mask manufacturing, etc., photosensitive dry film is often used as a temporary protective material for pattern transfer. For example, when manufacturing a printed circuit board, first, a dry film resist is pasted on a copper substrate, and a mask with a certain pattern is used to cover the photosensitive dry film for pattern exposure. Then, use a weak alkaline aqueous solution as a developer to remove unexposed parts, and then perform etching or electroplating to form a pattern. Finally, peel off and remove the cured part of the dry film, so as to realize the pattern transfer. [0003] Usually, the photosensitive dry film is composed of three layers, which are support fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16
CPCG03F7/16
Inventor 韩传龙李伟杰严晓慧李志强黄森彪周光大林建华
Owner HANGZHOU FIRST APPLIED MATERIAL CO LTD
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