Method for preparing hollow silicon spheres as well as hollow silicon spheres prepared therefrom
A silicon ball and hollow technology, applied in silicon, electrode manufacturing, vapor deposition manufacturing, etc., can solve the problems of high cost, difficult to achieve large-scale production, cumbersome process, etc., and achieve the effect of high capacity and good stability
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[0034] Preparation of HSS material
[0035] Nanoparticles used as templates in the present invention are selected from carbonates and oxides. The carbonate is preferably selected from calcium carbonate, magnesium carbonate, strontium carbonate, barium carbonate. The oxide is preferably selected from Al 2 o 3 , MgO, ZnO and SiO 2 .
[0036] The size of nanoparticles used as templates in the present invention is in the range of 10 nm to 100 nm.
[0037] The silicon source used in the present invention is selected from high-purity silanes, chlorosilanes, and the like. A variety of chlorosilanes can be used in the present invention, preferably trichlorosilane.
[0038] Chemical vapor deposition (CVD) employed in the present invention is a conventional technique. CVD can be simply described as carrying the source vapor of one or more gases into the reaction chamber through the carrier gas, causing chemical changes on the substrate surface, and depositing the desired solid su...
Embodiment 1
[0059] The preparation of embodiment 1 hollow silicon sphere HSS-1
[0060] The EV-E-006 produced by Hefei Aiwei Nano Technology Co., Ltd. was selected as the nano calcium carbonate template, and its particle size was 50-80nm. Chemical vapor deposition was performed in a horizontal tube furnace (60 mm inner diameter) heated to 450°C. Before the temperature reached 450°C, a mixture of 5% hydrogen and 95% argon was introduced into the furnace to create a reducing atmosphere and eliminate residual oxygen. Then, high-purity silane with a purity of 99.999% was carried by argon gas, and entered into a horizontal tube furnace at a temperature of 450° C. for 1.5 hours at a speed of 100 standard cubic centimeters per minute. The silane decomposes into silicon particles and hydrogen gas, and the silicon particles are finally deposited on the nano-calcium carbonate. The mixing weight ratio of silane and argon is 5:95. After deposition, a mixture of 5% hydrogen and 95% argon was reintr...
Embodiment 2
[0064] The preparation of embodiment 2 hollow silicon sphere HSS-2
[0065] Example 2 is roughly the same as Example 1, except that the time for chemical vapor deposition is 2 hours. That is, in the process of chemical vapor deposition, argon carries high-purity silane with a purity of 99.999%, and enters a horizontal tube furnace (inner diameter of 60mm) at a temperature of 450°C at a rate of 100 standard cubic centimeters per minute for 2 hours. .
[0066] Figure 8 The typical morphology of HSS-2 in shows that HSS-2 is mainly composed of interconnected hollow spheres with narrow primary particle size distribution. The wall thickness of the hollow spheres is about 16 nm.
[0067] Figure 10 The X-ray diffraction pattern confirmed that the HSS-2 material is also amorphous, since no obvious characteristic peaks of crystalline silicon are shown.
[0068] Figure 9 The SEM image in shows that HSS-2 has a secondary globular structure. The primary particle size is similar t...
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Abstract
Description
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