Instrument for Measuring Residual Stress of Thin Films on Flexible Transparent Substrates
A residual stress and transparent substrate technology, applied in the direction of force/torque/power measuring instruments, measuring devices, instruments, etc., can solve the problems of exceeding the measurement range, small curvature radius, and low reflectivity, so as to increase the measurable range and relatively Consistent position, effect of reducing the influence of interference
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[0027] Embodiments of the present invention are described in detail as follows in conjunction with accompanying drawings:
[0028] figure 1 It is the schematic diagram of the single-beam optical lever method, such as figure 1 and figure 2 As shown, the measuring instrument of the residual stress of the film on the flexible transparent substrate of the present invention adopts the principle of the optical lever method to measure the radius of curvature before and after the long film of the substrate, and utilizes the revised Stoney formula to obtain the residual stress; the residual stress of the film on the flexible transparent substrate is The measuring instrument includes an optical platform 25, a first support rod 8, an optical path system, a laser light source system, a sample support system, and a spot tracking three-dimensional motion system; the laser light source system and the optical path system are fixed on the first support rod, and the first The supporting rod ...
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