Glass with high anti-dazzle property and high light transmittance and preparation process thereof
A technology of light-transmitting glass and preparation process, applied in the direction of coating and other directions, can solve the problems of high cost, low transmittance, high light transmittance, etc., and achieve the effects of low processing cost, increased light transmittance, and reduced light reflectivity
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Embodiment 1
[0058] 1.1 Preparation of etching solution:
[0059] The weight composition of etching solution is:
[0060]
[0061]
[0062] The preparation process is:
[0063] Mix the raw materials in the above parts by weight uniformly at room temperature to prepare the etching solution.
[0064] 1.2SiO2 2 Sol preparation:
[0065] SiO 2 The volume composition of the sol is:
[0066]
[0067] The preparation process is:
[0068] (1) Mix 100 parts of tetraethyl orthosilicate (TEOS), 80 parts of 25% (w / w) ammonia water, 250 parts of glycerin, and 500 parts of deionized water (or double distilled water) after mixing, and let stand at room temperature for 100 Filter after 1 hour; (2) in the solution of step (1), add dropwise 10 parts of acetic acid and 40 parts of 5% (w / w) polyvinyl alcohol aqueous solution, at 50 ℃ for 24 hours, can obtain clear, transparent light blue SiO 2 Sol.
[0069] The sol was filtered through a 0.2 μm microporous membrane before use.
[0070] 1.3T...
Embodiment 2
[0085] 1.1 Preparation of etching solution:
[0086] The weight composition of etching solution is:
[0087]
[0088] The preparation process is:
[0089] Mix the raw materials in the above parts by weight uniformly at room temperature to prepare the etching solution.
[0090] 1.2SiO2 2 Sol preparation:
[0091] SiO 2 The volume composition of the sol is:
[0092]
[0093] The preparation process is:
[0094] (1) Mix 100 parts of tetraethyl orthosilicate (TEOS), 80 parts of 25% (w / w) ammonia water, 250 parts of glycerin, and 500 parts of deionized water (or double distilled water) after mixing, and let stand at room temperature for 100 Filter after 1 hour; (2) in the solution of step (1), add dropwise 10 parts of acetic acid and 40 parts of 5% (w / w) polyvinyl alcohol aqueous solution, at 50 ℃ for 24 hours, can obtain clear, transparent light blue SiO 2 Sol.
[0095] The sol was filtered through a 0.2 μm microporous membrane before use.
[0096] 1.3TiO 2 Sol pr...
Embodiment 3
[0109] 1.1 Preparation of etching solution:
[0110] The weight composition of etching solution is:
[0111]
[0112] Mix the raw materials in the above parts by weight uniformly at room temperature to prepare the etching solution.
[0113] 1.2SiO2 2 Sol preparation:
[0114] SiO 2 The volume composition of the sol is:
[0115]
[0116] The preparation process is:
[0117](1) Mix 120 parts of tetraethyl orthosilicate (TEOS), 100 parts of 25% (w / w) ammonia water, 200 parts of glycerin, and 500 parts of deionized water (or double distilled water) and stir them fully, and let stand at room temperature for 100 Filter after 1 hour; (2) in the solution of step (1), add dropwise 12 parts of acetic acid and 30 parts of 5% (w / w) polyvinyl alcohol aqueous solution, at 50 ℃ for 24 hours, can obtain clear, transparent light blue SiO 2 Sol.
[0118] The sol was filtered through a 0.2 μm microporous membrane before use.
[0119] 1.3TiO 2 Sol preparation;
[0120] The volume...
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