Double-side growth four-junction solar cell with reflecting layer and preparation method thereof
A solar cell and double-sided growth technology, applied in the field of solar photovoltaics, can solve the problems of small minority carrier diffusion length, low short-circuit current of GaInNAs cells, and inability to effectively collect photogenerated carriers, so as to improve photoelectric conversion performance and reduce costs Effect
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[0041] The present invention will be further described below in conjunction with specific embodiments.
[0042] Such as figure 1 As shown, the double-sided growth four-junction solar cell of this embodiment includes a GaAs substrate. The GaAs substrate is a double-sided polished n-type GaAs single wafer using metal organic chemical vapor deposition (MOCVD) technology. On the upper surface of the 4-inch GaAs substrate, a GaAs buffer layer, first tunnel junction, AlGaAs / GaInAsDBR reflective layer, GaInNAs sub-cell, second tunnel junction, AlAs / AlGaAsDBR reflective layer, The GaAs sub-cell, the third tunnel junction, the GaInP sub-cell, the ohmic contact layer, the anti-reflection film, and the front electrode are sequentially arranged with GaAs on the bottom surface of the GaAs substrate. 1-z In z P strain buffer layer, Ga 1-x In x As sub-cell and back electrode, the AlGaAs / GaInAsDBR reflective layer is used to reflect long-wave photons, and the AlAs / AlGaAsDBR reflective layer is us...
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