A preparation method of anti-reflection and anti-fingerprint coating film suitable for plastic substrates

A plastic substrate and anti-reflection technology, applied in chemical instruments and methods, nanotechnology for materials and surface science, coatings, etc., can solve complex processes, poor film adhesion, and unsuitability for plastic substrates, etc. problem, to achieve a firm effect

Active Publication Date: 2019-03-12
SOUTHWEAT UNIV OF SCI & TECH
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when these methods are applied to plastic substrates, there are many problems such as poor film adhesion, incapable of large-scale production, complicated process, poor repeatability, high cost or high temperature treatment, which is not suitable for plastic substrates.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A preparation method of anti-reflection and anti-fingerprint coating film suitable for plastic substrates
  • A preparation method of anti-reflection and anti-fingerprint coating film suitable for plastic substrates
  • A preparation method of anti-reflection and anti-fingerprint coating film suitable for plastic substrates

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] A method for preparing an anti-reflection and anti-fingerprint coating film suitable for plastic substrates, the steps are:

[0040] Mix 10 parts by mass of tetraethyl orthosilicate and 80 parts by mass of absolute ethanol evenly, then adjust the pH of the system to 8 with ammonia water (mass concentration 28%) under stirring, and after standing for 8 hours, add 10 parts by mass of tetraethyl orthosilicate Methyl disilazide, after standing for 24 hours, the solid nano-silica sol with a particle size of 20-40nm was obtained;

[0041] Dissolve 0.6 parts by mass of PAA (Mw=800~1000) in 3.2 parts by mass of ammonia water (mass concentration 28%), then pour it into 90 parts by mass of absolute ethanol, and stir for 4 times at 0.3 parts by mass each time Add tetraethyl orthosilicate at an interval of 1 hour, add 5 parts by mass of HMDS 2 hours after the fourth addition of ethyl acetate, and continue stirring for 6 hours to obtain a hollow nano-silica sol with a particle size ...

Embodiment 2

[0045] A method for preparing an anti-reflection and anti-fingerprint coating film suitable for plastic substrates, the steps are:

[0046] Mix 10 parts by mass of tetraethyl orthosilicate and 80 parts by mass of absolute ethanol evenly, then adjust the pH of the system to 8 with ammonia water (mass concentration 28%) under stirring, and after standing for 8 hours, add 10 parts by mass of HMDS , and then placed for 24 hours to obtain a solid nano-silica sol with a particle size of 20-40 nm.

[0047] Dissolve 0.6 parts by mass of PAA (Mw=800~1000) in 3.2 parts by mass of ammonia water (mass concentration 28%), then pour it into 90 parts by mass of absolute ethanol, and stir for 4 times at 0.3 parts by mass each time Ethyl orthosilicate was added at an interval of 1 hour, 5 parts by mass of HMDS was added 2 hours after the fourth addition of ethyl acetate, and stirring was continued for 6 hours to obtain a hollow nano-silica sol with a particle size of 80-150 nm.

[0048] The a...

Embodiment 3

[0051] A method for preparing an anti-reflection and anti-fingerprint coating film suitable for plastic substrates, the steps are:

[0052] Mix 10 parts by mass of tetraethyl orthosilicate and 80 parts by mass of absolute ethanol evenly, then adjust the pH of the system to 8 with ammonia water (mass concentration 28%) under stirring, and after standing for 8 hours, add 10 parts by mass of HMDS , and then placed for 24 hours to obtain a solid nano-silica sol with a particle size of 20-40 nm.

[0053] Dissolve 0.6 parts by mass of PAA (Mw=800~1000) in 3.2 parts by mass of ammonia water (mass concentration 28%), then pour it into 90 parts by mass of absolute ethanol, and stir for 4 times at 0.3 parts by mass each time Ethyl orthosilicate was added at an interval of 1 hour, 5 parts by mass of HMDS was added 2 hours after the fourth addition of ethyl acetate, and stirring was continued for 6 hours to obtain a hollow nano-silica sol with a particle size of 80-150 nm.

[0054] The a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
particle diameteraaaaaaaaaa
contact angleaaaaaaaaaa
Login to view more

Abstract

The invention discloses a preparation method of an anti-reflection and anti-fingerprint coating film suitable for a plastic substrate. The preparation method is characterized in that 5-15 parts by mass of an ultraviolet curing coating solution, 1-5 parts by mass of fluororesin, 30-40 parts by mass of solid nano-silicon sol and 40-50 parts by mass of hollow nano-silicon sol are mixed uniformly, and a coating liquid is prepared; the coating liquid is applied to the surface of the plastic substrate in a shower coating, spray coating or dip coating manner; the plastic substrate coated with the coating liquid is dried at the temperature of 75-90 DEG C for 1-15 min and irradiated under ultraviolet light, and a coating product is prepared. With the adoption of the preparation method, the film layer of the coating product and the substrate are firmly combined, the reflection rate in the visible light area is not higher than 5%, the water drop contact angle is not lower than 110 degrees, and the coating film can be widely applied to fields such as display panels of electronic products, solar photovoltaic assemblies, product display cabinets, advertising boxes and the like and has wide market prospect.

Description

technical field [0001] The invention belongs to a preparation method of a functional film, and relates to a preparation method of an anti-reflection and anti-fingerprint coating film suitable for plastic substrates. The plastic substrate product with the anti-reflection and anti-fingerprint coating film prepared by the invention can be widely used in the fields of window panels of electronic products, solar photovoltaic modules, product display cabinets, advertising boxes and the like. Background technique [0002] With the popularity of electronic products, optical plastics represented by polycarbonate (referred to as PC), polymethyl methacrylate (referred to as PMMA) or polycarbonate-polymethyl methacrylate (referred to as PC-PMMA) composite materials Has been widely used. The market also puts forward more and more demands on the functionality of these products, such as wear resistance, anti-fingerprint, anti-glare, anti-fog, anti-reflection, etc. At present, the functio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C08J7/04C09D1/00C01B33/141C01B33/146B82Y30/00
CPCC01B33/141C01B33/146C01P2004/64C08J7/04C08J2333/12C08J2369/00C09D1/00
Inventor 雷洪
Owner SOUTHWEAT UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap