Methods of Aluminum Etching
An aluminum etching and etching technology, applied in the manufacturing of electrical components, circuits, semiconductor/solid-state devices, etc., can solve problems such as short circuit, circuit etching residue, affecting product yield, etc., to reduce production, reduce content, and solve circuit etching. Effects of Residues and Short Circuits
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[0039] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0040] see figure 1 , the invention provides a method for aluminum etching, comprising:
[0041] Step 1. Provide an aluminum film substrate, the aluminum film substrate includes a base substrate and an aluminum film arranged on the base substrate, coat a photoresist layer on the aluminum film, and use a photomask to cover the photoresist layer After exposure and development, a pattern of the photoresist layer is formed.
[0042] Step 2, provide a dry etching equipment, the dry etching equipment has an etching chamber, put the aluminum film substrate with a photoresist layer pattern into the etching chamber, pass chlorine-containing gas into the etching chamber, The aluminum film substrate is etched, and the chlorine-containing gas etches the...
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