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Grid mesh and ionic source

A technology of ion source and grid, which is applied in the field of ion source, can solve the problems of easy thermal deformation of the grid, achieve the effect of improving repeatability, solving thermal deformation problems, and maintaining uniformity and stability

Active Publication Date: 2016-11-23
北京埃德万斯离子束技术研究所股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a grid with radial thermal strain grooves and an ion source for the defect that the grid of the existing ion source is easily thermally deformed.

Method used

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  • Grid mesh and ionic source
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  • Grid mesh and ionic source

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Embodiment Construction

[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.

[0025] see figure 2 , is a grid structure diagram according to the first embodiment of the present invention. like figure 2 As shown, a grid hole area 11 with grid holes is provided in the middle of the grid, and a plurality of thermal strain grooves 12 are opened radially outward from the edge of the grid hole area 11 on the grid. These thermal strain grooves 12 run through the upper surface and the lower surface of the grid. In some embodiments of the present invention, the thermal strain groove 12 extends from the circumference of the grid hole area 11 to the edge of the grid along the radial direction of the grid. Preferably, the end of the thermal strain groove 12 facing the center of the grid keeps a certain distance from the circumferen...

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Abstract

The invention relates to a grid mesh, which is used for an ionic optical system of an ionic source. The grid mesh is provided with a grid hole area with grid holes, a plurality of thermal stress slots are formed in the grid mesh from the edge of the grid hole area in an outward radiation manner, and the thermal stress slots penetrate through the upper surface and the lower surface of the grid mesh. The invention further provides an ionic source using the grid mesh. The radiating thermal stress slots are formed in the grid mesh, so that the thermal deformation problem of the melting-resistant metal plane grid mesh can be thoroughly solved, the uniformness and stability of the ion beam stream can also be maintained, the long-term and repeated ionic source working under high-temperature environment can be met, and the ionic source performance repeatability and the ion beam processing technique uniformness can be improved.

Description

technical field [0001] The invention relates to the technical field of ion sources, and more specifically, to a grid and an ion source. Background technique [0002] Ion beam processing is one of the important processes for micro-nano precision processing of contemporary micro-electro-mechanical systems (MEMS). It is the plasma generated by the glow discharge of inert gas. After extraction, beam forming, acceleration, and neutralization, a high-energy and high-speed neutral ion beam is formed. It can treat metals, alloys, oxides, compounds, Workpieces of mixed materials, semiconductors, insulators, superconductors, etc. are subjected to micro-nano ultra-fine processing such as polishing, cleaning, etching, sputtering, deposition, coating, and implantation. The ion source is the heart of an ion beam processing system. see figure 1 , is a schematic structural diagram of an existing ion source. Among them, the ion optical system is used to extract and accelerate the plasma ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/08
CPCH01J37/08
Inventor 刁克明
Owner 北京埃德万斯离子束技术研究所股份有限公司
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