Method for flexibly making curved-surface bionic compound eye structure

A bionic compound eye and curved surface technology, applied in the field of optical bionics, can solve the problems of complex curved grayscale mask design, high equipment cost, low processing efficiency, etc., and achieve the effects of light weight, small size and low cost

Active Publication Date: 2016-12-07
UNIV OF SCI & TECH OF CHINA
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Problems solved by technology

Curved surface lithography generally includes droplet method and gray-scale mask lithography. For droplet method, due to the limitation of droplet process precision, it is difficult to achieve a single lens size below 1 mm; for gray-scale mask lithography, Although it is theoretically possible to manufacture a small-sized lens stru

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  • Method for flexibly making curved-surface bionic compound eye structure
  • Method for flexibly making curved-surface bionic compound eye structure
  • Method for flexibly making curved-surface bionic compound eye structure

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Embodiment Construction

[0027] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0028] Such as figure 1 As shown, the manufacturing method of the curved surface bionic compound eye structure of the present invention is specifically:

[0029] Step 1 Spin-coat three layers of positive photoresist on the substrate, wherein the photoresist of the bottom layer and the top layer is AZ4620 photoresist, and the middle layer is S1813 photoresist;

[0030] In step 2, two maskless exposures are performed, the first time fully exposes the three layers of photoresist, and the second time only exposes the photoresist of the middle layer and the top layer;

[0031] Step 3 development obtains preliminary multi-level structure;

[0032] Step 4: Carry out two consecutive thermal reflow processes, the first ordinary thermal reflow to obtain the large-eye lens structure, and the second inverted non-contact thermal reflow to obtain the small-eye lens array...

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Abstract

The invention discloses a method for flexibly making a curved-surface bionic compound eye structure. The method comprises the following steps that a substrate is coated with three layers of positive photoresist in a spinning mode, wherein AZ4620 photoresist is adopted on the bottom layer and the top layer, and S1813 photoresist is adopted in the middle layer; two times of mask-free exposure is carried out, wherein the three layers of photoresist is completely and thoroughly exposed at the first time, and only the photoresist on the middle layer and the top layer is thoroughly exposed at the second time; development is carried out to obtain a primary multi-level structure; two times of hot reflux technology treatment is consecutively carried out, wherein common hot reflux is carried out at the first time to obtain a hot reflux large lens structure, and inverse non-contact type hot reflux is carried out at the second time to obtain a small lens array structure distributed on a compound eye large lens. The method has the advantages of being simple in technological operation, short in processing cycle, low in cost, capable of controlling the shape and the like, and the requirement for large view field imaging can be well met.

Description

technical field [0001] The invention relates to the field of optical bionics, in particular to a method for flexibly manufacturing a bionic compound eye structure with a curved surface. Background technique [0002] Bionic compound eyes have the advantages of small size, light weight, large field of view, high sensitivity, and speed measurement, and are widely used in national defense, military and civilian industries. For curved bionic compound eyes whose field of view is larger than that of planar bionic compound eyes, the main methods for making curved bionic compound eyes include ultra-precision machining technology, curved surface photolithography, and two-photon femtosecond laser direct writing technology. [0003] Among them, ultra-precision machining technology has high equipment cost and high operation requirements, and has certain restrictions on the processing size, which generally does not exceed the micron level. Curved surface lithography generally includes dr...

Claims

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Application Information

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IPC IPC(8): G02B3/00
CPCG02B3/0018G02B3/0031
Inventor 李木军黄胜洲沈连婠
Owner UNIV OF SCI & TECH OF CHINA
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