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A visible light and infrared compatible camouflage material and preparation method thereof

A visible light and infrared technology, used in protective equipment, camouflage devices, clothing, etc., can solve the problems of low physical and mechanical properties and adhesion, inconvenient carrying and application, high infrared emissivity, and achieve good visible light camouflage effect, excellent camouflage Performance, the effect of good adhesion

Active Publication Date: 2018-04-03
NAT UNIV OF DEFENSE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the color varieties of infrared stealth coatings are still less at present, and no color series has been formed; in addition, when infrared stealth coatings are coated, the thickness is large, resulting in a large weight, which is inconvenient to carry and apply; coatings made of infrared stealth coatings, Its physical and mechanical properties and adhesion are low, and it is difficult to accept ultraviolet radiation and atmospheric corrosion for a long time; and the infrared emissivity of visible light and infrared compatible camouflage materials using infrared stealth coatings is relatively high, above 0.6, and it is difficult to meet the requirements of military materials

Method used

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  • A visible light and infrared compatible camouflage material and preparation method thereof
  • A visible light and infrared compatible camouflage material and preparation method thereof
  • A visible light and infrared compatible camouflage material and preparation method thereof

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Embodiment 1

[0034] A visible light and infrared compatible camouflage material of the present invention is a layered structure, such as figure 2 As shown, from bottom to top, it is composed of substrate 1 (Si sheet), infrared low emissivity layer 2 and oxide thin film layer 3, wherein infrared low emissivity layer 2 is an Al thin film with a thickness of 160nm, and oxide thin film layer 3 Cr with a thickness of 300nm 2 o 3 film.

[0035] The preparation method of the visible light and infrared compatible camouflage material of this embodiment includes the following steps:

[0036] (1) Prepare a layer of Al film with a thickness of 160nm as the infrared low emissivity layer by radio frequency magnetron sputtering method on the Si substrate, wherein the radio frequency magnetron sputtering process conditions are: the Al target is used as the sputtering target, The background vacuum is 7×10 -8 Torr, the sputtering temperature is room temperature, the sputtering pressure is 5mTorr, and t...

Embodiment 2

[0041] A visible light and infrared compatible camouflage material of the present invention is a layered structure, such as figure 2 As shown, from bottom to top, it is composed of substrate 1 (Si sheet), infrared low emissivity layer 2 and oxide thin film layer 3, wherein infrared low emissivity layer 2 is an Ag thin film with a thickness of 160nm, and oxide thin film layer 3 Cr with a thickness of 400nm 2 o 3 film.

[0042] The preparation method of the visible light and infrared compatible camouflage material of this embodiment includes the following steps:

[0043] (1) Prepare a layer of Al film with a thickness of 160nm as the infrared low emissivity layer by radio frequency magnetron sputtering method on the Si substrate, wherein the radio frequency magnetron sputtering process conditions are: the Al target is used as the sputtering target, The background vacuum is 5×10 -8 Torr, the sputtering temperature is room temperature, the sputtering pressure is 3mTorr, and t...

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Abstract

The invention discloses a visible light and infrared light compatible camouflage material which is of a layered structure and sequentially comprises a substrate, a low infrared emissivity layer and an oxide film layer from bottom to top; and the oxide film layer is a Cr2O3 film. A preparation method comprises the following steps: (1) preparing the low infrared emissivity layer on the substrate through a radio frequency magnetron sputtering method; and (2) preparing the Cr2O3 film on the surface of the low infrared emissivity layer through the radio frequency magnetron sputtering method, and finishing preparation of the visible light and infrared light compatible camouflage material. According to the visible light and infrared light compatible camouflage material, the color of the oxide film layer can be regulated and controlled and can be green and also other multiple colors, and the visible light and infrared light compatible camouflage material can be suitable for camouflage requirements under different conditions.

Description

technical field [0001] The invention belongs to the field of stealth materials, in particular to a visible light and infrared compatible camouflage material and a preparation method thereof. Background technique [0002] In modern warfare, with the continuous development of detectors, single-band camouflage materials are difficult to meet the needs of modern warfare. It is an inevitable trend in the development of camouflage technology to achieve multi-band compatible camouflage such as visible light and infrared. [0003] Visible light and infrared camouflage materials refer to camouflage materials that have both visible light and infrared camouflage properties. On the one hand, it must have different colors, and can use its own color characteristics to reduce the brightness, color and motion contrast between the target and the background, so as to control the visual signal of the target, so as to reduce the detection of the target by the visible light detection system. pr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F41H3/00B32B9/04B32B33/00
CPCB32B9/047B32B33/00B32B2255/02B32B2255/205B32B2307/416B32B2571/00F41H3/00
Inventor 程海峰刘东青李阳张朝阳彭任富
Owner NAT UNIV OF DEFENSE TECH
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