Active energy ray-curable composition and film using same

An active energy ray, curable composition technology, applied in chemical instruments and methods, synthetic resin layered products, coatings, etc., can solve problems such as film adhesion, dust adhesion, etc., to prevent adhesion, prevent adhesion, The effect of suppressing adhesion of dust and the like

Active Publication Date: 2017-02-22
DIC CORP
View PDF4 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In this winding process, static electricity is generated on the surface of the film due to the friction between the films. Therefore, during reprocessing, when the film is released from the roll, there will be a problem that the films will stick to each other, and dust and the like will easily adhere to the surface due to static electricity. Membrane Surface Problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Active energy ray-curable composition and film using same
  • Active energy ray-curable composition and film using same
  • Active energy ray-curable composition and film using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0061] Hereinafter, the present invention will be described more specifically using examples.

Synthetic example 1

[0062] (Synthesis Example 1: Synthesis of Resin (1) with Quaternary Ammonium Salt)

[0063] Add 80% of 2-(methacryloyloxy)ethyltrimethylammonium methylphenylsulfonate (hereinafter referred to as "DMS") into a flask equipped with a stirring device, a reflux condenser, and a nitrogen introduction pipe. Mass % aqueous solution 87.5 parts by mass (70 parts by mass as DMS), methoxypolyethylene glycol methacrylate ("BLEMMER PME-4000" manufactured by NOF Corporation; number of repeating units n≈90, molecular weight 4,000) 30 parts by mass, 94.5 parts by mass of methanol, 9.45 parts by mass of propylene glycol monomethyl ether, and 1.08 parts by mass of a polymerization initiator (azobisisobutyronitrile) were reacted at 80° C. for 6 hours under a nitrogen atmosphere. Next, methanol was added and diluted, and the 45 mass % solution of the resin (1) which has a quaternary ammonium salt (sulfonate) was obtained. The weight average molecular weight of the obtained resin was 10,000.

Synthetic example 2

[0064] (Synthesis Example 2: Synthesis of Resin (2) with Quaternary Ammonium Salt)

[0065] Add 80% of 2-(methacryloyloxy)ethyltrimethylammonium methylphenylsulfonate (hereinafter referred to as "DMS") into a flask equipped with a stirring device, a reflux condenser, and a nitrogen introduction pipe. Mass % aqueous solution 87.5 parts by mass (70 parts by mass as DMS), methoxypolyethylene glycol methacrylate ("BLEMMERPME-1000" manufactured by NOF Corporation; number of repeating units n≈23, molecular weight 1,000) 30 Parts by mass, 94.5 parts by mass of methanol, 9.45 parts by mass of propylene glycol monomethyl ether, and 1.08 parts by mass of a polymerization initiator (azobisisobutyronitrile) were reacted at 80° C. for 6 hours under a nitrogen atmosphere. Next, methanol was added and diluted, and the 45 mass % solution of the resin (2) which has a quaternary ammonium salt (sulfonate) was obtained. The weight average molecular weight of the obtained resin was 10,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides: an active energy ray-curable composition comprising an active energy ray-curable compound (A) and a resin (B) including a quaternary ammonium salt represented by general formula (1); and a film using said composition. This active energy ray-curable composition is capable of forming a cured coating film having antistatic properties comparable to or better than the antistatic properties of conventional compositions without using halogens such as chlorides, i.e., while being free of halogens. (In the formula, R1 to R3 each independently represent an alkyl group or a phenyl group, and R4 represents an alkyl group, an alkoxy group, a phenyl group, or an oxyphenyl group.)

Description

technical field [0001] The present invention relates to an active energy ray-curable composition capable of forming a hard coat layer having high antistatic properties on a film surface by applying and curing the film surface, and a film using the same. Background technique [0002] Various resin films are used for anti-scratch films on the surface of flat panel displays (FPD) such as liquid crystal displays (LCD), organic EL displays (OLED), and plasma displays (PDP), decorative films (sheets) for interior and exterior of automobiles, and windows Various applications such as low-reflection film and heat ray cutting film. However, the surface of a resin film is soft and has low scratch resistance, so in order to compensate for this, a hard coating agent containing a UV curable composition or the like is generally applied to the film surface and cured to provide a hard coating on the film surface. coating. A brief description of the process of setting the hard coat layer is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08F2/44B32B27/18C08J7/04C08J7/043C08J7/044C08J7/046
CPCB32B27/18C08F2/44C08J7/043C08J7/046C08J7/044C08K5/3725C08F20/38
Inventor 塚本卓司麸山解
Owner DIC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products