Narrowband Absorbing Superconducting Nanowire Single Photon Detector
A single-photon detector and superconducting nanowire technology, which is applied in the field of light detection, can solve the problems of low absorption efficiency, performance degradation of superconducting nanowire single-photon detector, influence of absorption efficiency, etc., so as to avoid the influence of absorption efficiency, Improve the detection efficiency of the device and suppress the effect of dark counting
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Embodiment 1
[0051] Such as image 3 As shown, this embodiment provides a narrowband absorption superconducting nanowire single photon detector, including:
[0052] substrate 20;
[0053] A high reflection film 21 located on the surface of the substrate 20;
[0054] Superconducting nanowires 22, located on the surface of the high reflection film 21;
[0055] The multilayer thin film filter 23 is located on the surface of the high reflection film 21 , and the bottom thin film layer of the multilayer thin film filter 23 covers the superconducting nanowire 22 .
[0056] As an example, the narrow-band absorbing superconducting nanowire single photon detector of this embodiment is a superconducting nanowire single photon detector with a front-incidence structure.
[0057] As an example, the substrate 20 includes a silicon substrate, an MgO substrate or a sapphire substrate, and the thickness of the substrate 20 is 300-500 microns. In this embodiment, the substrate 20 is a silicon substrate ...
Embodiment 2
[0068] Such as Figure 5 As shown, this embodiment also provides a narrow-band absorbing superconducting nanowire single-photon detector. The basic structure of the narrow-band absorbing superconducting nanowire single-photon detector in this embodiment is basically the same as that in Embodiment 1. The difference between the two is : The multilayer thin film filter 23 described in Embodiment 1 is an alternately stacked SiO 2 Thin film layer 211 with TiO 2 thin film layer 213; and the multilayer thin film filter 23 described in this embodiment is an alternately stacked SiO 2 Thin film layer 211 and Ta 2 o 5 film layer 214 . The multilayer thin film filter 23 can be the SiO 2 The thin film layer 211 is located on the surface of the high reflection film 21, and the Ta 2 o 5 Thin film layer 214 is located on the SiO 2 Above the thin film layer 211; also can be as Figure 5 Ta 2 o 5 The thin film layer 214 is located on the surface of the high reflection film 21, and th...
Embodiment 3
[0070] Such as Figure 6 As shown, this embodiment provides a narrow-band absorbing superconducting nanowire single-photon detector. The basic structure of the narrow-band absorbing superconducting nanowire single-photon detector in this embodiment is basically the same as that of Embodiment 1. The difference between the two is: The high reflection film 21 described in Example 1 is alternately stacked SiO 2 thin film layer 211 and Si thin film layer 212, and the high reflection film 21 described in this embodiment is an alternately stacked SiO 2 Thin film layer 211 with TiO 2 Thin film layer 213; the multilayer thin film filter 23 described in embodiment 1 is SiO stacked alternately 2 Thin film layer 211 with TiO 2 thin film layer 213; and the multilayer thin film filter 23 described in this embodiment is an alternately stacked SiO 2 thin film layer 211 and Si thin film layer 212 . The high reflection film 21 can be the SiO 2 The thin film layer 211 is located on the sur...
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