Magnetron sputtering based production technology of NiO electrochromic film and glass
An electrochromic and magnetron sputtering technology, applied in sputtering plating, metal material coating process, ion implantation plating, etc., can solve the problem of unfavorable large-scale continuous production, magnetron cathode can not start arc, can not maintain Glow discharge and other problems, to achieve the effect of inhibiting poisoning and ignition, strong adhesion, eliminating poisoning and ignition
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[0017] The present invention will be described in more detail below in conjunction with the accompanying drawings and embodiments.
[0018] The invention discloses a NiO electrochromic film production process based on magnetron sputtering, such as figure 1 As shown, the process is realized based on vertical continuous vacuum magnetron sputtering equipment, and the process includes: first utilizing DC magnetron sputtering to deposit an ITO nano-film layer 2 on a glass substrate 1, and then depositing an ITO nano-film layer 2 on the ITO nano-film layer 2 The NiO anode electrochromic thin film layer 3 is deposited by DC magnetron sputtering.
[0019] As a preferred method, in the process of sputtering and depositing the ITO nano-film layer 2, the chemical composition of the selected ITO target is In2O3 / SnO290 / 10 ratio), purity>99.99%, relative density ≥ 95%, resistivity ≤ 1.8×10-4Ω.cm.
[0020] Further, in this embodiment, the DC magnetron sputtering is used to deposit the ITO ...
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