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Magnetron sputtering based production technology of NiO electrochromic film and glass

An electrochromic and magnetron sputtering technology, applied in sputtering plating, metal material coating process, ion implantation plating, etc., can solve the problem of unfavorable large-scale continuous production, magnetron cathode can not start arc, can not maintain Glow discharge and other problems, to achieve the effect of inhibiting poisoning and ignition, strong adhesion, eliminating poisoning and ignition

Inactive Publication Date: 2017-05-17
SHENZHEN SANXIN JMT GLASS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, the DC reaction magnetron cathode cannot start the arc, cannot maintain the normal glow discharge, and the magnetron sputtering will not be able to proceed.
In order to continue to deposit the NiO anode electrochromic film, only the oxides on the target surface of the sputtering cathode and various baffles in the vacuum box must be cleaned frequently, which will inevitably lead to low production efficiency and high cost, which is not conducive to large-scale continuous Production

Method used

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  • Magnetron sputtering based production technology of NiO electrochromic film and glass

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Embodiment Construction

[0017] The present invention will be described in more detail below in conjunction with the accompanying drawings and embodiments.

[0018] The invention discloses a NiO electrochromic film production process based on magnetron sputtering, such as figure 1 As shown, the process is realized based on vertical continuous vacuum magnetron sputtering equipment, and the process includes: first utilizing DC magnetron sputtering to deposit an ITO nano-film layer 2 on a glass substrate 1, and then depositing an ITO nano-film layer 2 on the ITO nano-film layer 2 The NiO anode electrochromic thin film layer 3 is deposited by DC magnetron sputtering.

[0019] As a preferred method, in the process of sputtering and depositing the ITO nano-film layer 2, the chemical composition of the selected ITO target is In2O3 / SnO290 / 10 ratio), purity>99.99%, relative density ≥ 95%, resistivity ≤ 1.8×10-4Ω.cm.

[0020] Further, in this embodiment, the DC magnetron sputtering is used to deposit the ITO ...

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Abstract

The invention discloses a magnetron sputtering based production technology of a NiO electrochromic film. The technology is performed based on a vertical continuous vacuum magnetron sputtering device. The technology comprises the following steps: depositing an ITO nano film layer on a glass substrate by a DC magnetron sputtering method; and then depositing a NiO anodic electrochromic film on the ITO nano film layer through the DC magnetron sputtering method. The technology has the beneficial effects that the adhesive force of the film to a substrate is high; the film obtained by sputtering is high in purity; the density and filming uniformity are high; and the sputtering technology is high in repeatability.

Description

technical field [0001] The invention relates to a magnetron sputtering process, in particular to a magnetron sputtering-based NiO electrochromic film production process and glass prepared by the process. Background technique [0002] Electrochromism refers to the reversible color change under the action of external electric field and current. Electrochromic thin films are very attractive in the fields of electrochromic storage devices, buildings, vehicles, ships and airplanes, non-glare mirrors, smart windows, and electrochromic displays in the fields of building energy saving, military anti-counterfeiting and information display. For example, smart windows can selectively absorb or reflect external heat radiation and prevent internal heat diffusion, so that buildings can obtain the best lighting while minimizing energy consumption. The characteristics of pollution and intelligence. In recent years, with the enhancement of people's awareness of energy saving and environmen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/352C23C14/0036C23C14/085C23C14/086
Inventor 张忠义
Owner SHENZHEN SANXIN JMT GLASS
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