Surface modification mask plate, manufacturing method thereof and manufacturing method of electroluminescence device

A technology of surface modification and production method, which is applied in the field of optics, can solve the problems of expensive equipment investment, and achieve the effect of improving orientation and reducing costs

Active Publication Date: 2017-05-24
NANJING TECH CORP LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The main purpose of the present invention is to provide a surface-modified mask, its manufacturing method, and the manufacturing method of electroluminescent devices, so as

Method used

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  • Surface modification mask plate, manufacturing method thereof and manufacturing method of electroluminescence device
  • Surface modification mask plate, manufacturing method thereof and manufacturing method of electroluminescence device
  • Surface modification mask plate, manufacturing method thereof and manufacturing method of electroluminescence device

Examples

Experimental program
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Effect test

Embodiment 1

[0045] The steps of the method for fabricating a surface-modified mask provided in this embodiment include:

[0046] Step S01, immersing the mask in a solution with a hydrophobic material, the hydrophobic material being heptadecafluorodecyltrimethoxysilane, so that the hydrophobic material is fixed on the surface of the mask;

[0047] Step S02, separating the mask plate immobilized with the hydrophobic material from the solution, and drying the mask plate;

[0048] Step S03, placing the first mask on the first surface of the mask plate with 96×64 hollowed-out parts, the first mask is composed of 96×64 first shielding parts and first transparent parts connecting each first shielding part. Composition of light parts, the first shielding part corresponds to the hollow part one by one, and the area of ​​each first shielding part in one-to-one correspondence is larger than the area of ​​each hollow part, and the UV lamp is used to emit ultraviolet light with a wavelength of 185nm a...

Embodiment 2

[0050] The steps of the method for fabricating a surface-modified mask provided in this embodiment include:

[0051] Step S01, immersing the mask in a solution with a hydrophobic material, the hydrophobic material being heptadecafluorodecyltrimethoxysilane, so that the hydrophobic material is fixed on the surface of the mask;

[0052] Step S02, separating the mask plate immobilized with the hydrophobic material from the solution, and drying the mask plate;

[0053] Step S03, placing the second photomask on the mask plate with 96×64 hollowed-out parts, the second photomask is composed of 96×64 second light-transmitting parts and a second shielding part connecting the second light-transmitting parts , the second light-transmitting part corresponds to the hollow part one-to-one, and the area of ​​each second light-transmitting part in one-to-one correspondence is larger than the area of ​​each hollow part, and a UV lamp is used to emit ultraviolet light with a wavelength of 185nm...

Embodiment 3

[0055] The fabrication method of the electroluminescent device provided in this embodiment comprises the following steps:

[0056] Step S1, providing a first electrode substrate with a pixel isolation structure, the pixel isolation structure has 96×64 mutually isolated sub-pixel regions, the first electrode substrate is a substrate with an anode layer, and the anode layer is an ITO anode;

[0057] In step S2, the surface modification mask provided in Example 2 is placed on the side of the first electrode substrate having the pixel isolation structure, the hollow part of the surface modification mask corresponds to the sub-pixel area, and the surface modification mask It has a modified surface including a hydrophilic surface and a hydrophobic surface, the hydrophilic surface surrounds the hollow part, and the modified surface other than the hydrophilic surface is a hydrophobic surface;

[0058] Step S3, using an inkjet printing (model Dimatix Materials Printer DMP-2831) process...

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Abstract

The invention provides a surface modification mask plate, a manufacturing method thereof and a manufacturing method of an electroluminescence device. The surface modification mask plate has multiple hollow parts and a modified surface; the modified surface includes a first modified surface and a second modified surface; the first modified surface surrounds the hollow parts; the modified surface besides of the first modified surface is the second modified surface; and the first modified surface and the second modified surface are respectively a hydrophilic surface and a hydrophobic surface. When the surface modification mask plate is used for preparing the electroluminescence device, hydrophilic or hydrophobic ink cannot be stained on the surface modification mask plate, so that the mask plate is used for improving the material guidance performance, a spraying process in a solution method can be used for manufacturing pixels, ink jet printing equipment with lower precision can be used for manufacturing the pixels, and finally, the cost needed by precise ink jet printing equipment is reduced.

Description

technical field [0001] The invention relates to the field of optical technology, in particular to a surface-modified mask, a manufacturing method thereof, and a manufacturing method of an electroluminescent device. Background technique [0002] With the continuous development of science and technology, people's requirements for display quality continue to increase. OLED (Organic Light Emitting Diode) and QLED (Quantum Dot Light Emitting Diode) are considered to be the most representative display technologies in the future. OLED usually adopts evaporation method to prepare the above-mentioned electroluminescent device, that is, cover the mask plate above the substrate and perform multiple vacuum thermal evaporation to prepare RGB pixels. For example, when evaporating R pixels, the positions corresponding to GB pixels The template is covered so that it is not evaporated. In the above method, the utilization rate of the material is low, resulting in extremely high cost. Based o...

Claims

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Application Information

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IPC IPC(8): B41M5/00H01L51/56
Inventor 甄常刮顾辛艳
Owner NANJING TECH CORP LTD
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