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Multi-sulfydryl-alkene photosensitizing coating with higher mechanical property and preparation method of multi-sulfydryl-alkene photosensitizing coating

An ene photosensitive and mechanical technology, applied in the field of polymercapto-ene photosensitive coatings and preparations, can solve the problems of poor mechanical properties and high crosslinking density, and achieve excellent mechanical properties and simple preparation methods

Active Publication Date: 2017-05-24
国科广化(南雄)新材料研究院有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Traditional mercapto-ene photosensitive coatings have high crosslinking density due to the multi-functionality of the monomers, which makes the mechanical properties of the material poor, especially the tensile strength and elastic modulus properties.

Method used

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  • Multi-sulfydryl-alkene photosensitizing coating with higher mechanical property and preparation method of multi-sulfydryl-alkene photosensitizing coating
  • Multi-sulfydryl-alkene photosensitizing coating with higher mechanical property and preparation method of multi-sulfydryl-alkene photosensitizing coating
  • Multi-sulfydryl-alkene photosensitizing coating with higher mechanical property and preparation method of multi-sulfydryl-alkene photosensitizing coating

Examples

Experimental program
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Effect test

Embodiment 1

[0029] A polymercapto-ene photosensitive coating with relatively high mechanical properties and a preparation method thereof, the specific preparation steps are as follows:

[0030] Add the photoinitiator 2-hydroxy-2-methyl-1-phenylacetone into the multi-mercapto compound (SH-3), stir at room temperature to make the photoinitiator completely dissolved or uniform, and then add 1,3,5-tris Triallyl polycyanate, protected from light, and stirred evenly to obtain a polymercapto-ene photosensitive coating. The consumption of polyhydric mercapto compound (SH-3) and 1,3,5-triallyl cyanurate is the mol ratio=1 of mercapto / C=C double bond, and the consumption of photoinitiator is polyhydric mercapto compound and 0.5% of the total weight of vinyl compounds.

[0031] The polymercapto-ene photosensitive coating was left to stand for 30 minutes, and was formed into a film at room temperature under ultraviolet light (film formation time was 30 s), and the obtained sample was named R3.

[0...

Embodiment 2

[0035] A kind of polymercapto-ene photosensitive coating and preparation method with higher mechanical properties of the present embodiment, the specific preparation steps are as follows:

[0036] Add the photoinitiator 2-hydroxy-2-methyl-1-phenylacetone into the multi-mercapto compound (SH-4), stir at room temperature to make the photoinitiator completely dissolved or uniform, and then add 1,3,5-tris Triallyl polycyanate, protected from light, and stirred evenly to obtain a polymercapto-ene photosensitive coating. The consumption of described polyhydric mercapto compound (SH-4) and 1,3,5-triallyl cyanurate is that the molar ratio of mercapto / C=C double bond=1, and the consumption of photoinitiator is polyhydric mercapto 0.5% of the combined weight of compound and vinyl compound.

[0037] The polymercapto-ene photosensitive coating was left to stand for 30 minutes, and a film was formed under ultraviolet light at room temperature (film formation time was 30 s), and the obtain...

Embodiment 3

[0041] A kind of polymercapto-ene photosensitive coating and preparation method with higher mechanical properties of the present embodiment, the specific preparation steps are as follows:

[0042] Add the photoinitiator 2-hydroxy-2-methyl-1-phenylacetone into the polyhydric mercapto compound (SH-5), stir at room temperature to make the photoinitiator completely dissolved or uniform, and then add 1,3,5-tris Triallyl polycyanate, protected from light, and stirred evenly to obtain a polymercapto-ene photosensitive coating. The consumption of described polyhydric mercapto compound (SH-5) and 1,3,5-triallyl cyanurate is that the molar ratio of thiol / C=C double bond=1, and the consumption of photoinitiator is polyhydric thiol 0.5% of the combined weight of compound and vinyl compound.

[0043] The polymercapto-ene photosensitive coating was left to stand for 30 minutes, and a film was formed under ultraviolet light at room temperature (film formation time was 30 s), and the obtaine...

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Abstract

The invention belongs to the field of sulfydryl-alkene photosensitizing materials, and discloses a multi-sulfydryl-alkene photosensitizing coating with a higher mechanical property and a preparation method of the multi-sulfydryl-alkene photosensitizing coating. The multi-sulfydryl-alkene photosensitizing coating is prepared from the following components of a multi-sulfydryl compound, a multi-vinyl compound and a photoinitiator; a preparation method of the multi-sulfydryl compound comprises the following steps: conducting an esterification reaction on dipentaerythritol and adipic acid under the atmosphere of N2, then adding 3-sulfydryl propionic acid, a catalyst and a cyclohexane, heating, flowing back, distributing water, stopping reaction after the theoretical water yield is reached, cooling, allowing standing still for layering, taking a crude product at the lower layer, extracting, and removing a residue extraction agent in a heavy phase to obtain the multi-sulfydryl compound. The photosensitizing coating has an excellent mechanical property, and the preparation method is simple.

Description

technical field [0001] The invention belongs to the field of mercapto-ene photosensitive materials, and in particular relates to a polymercapto-ene photosensitive coating with relatively high mechanical properties and a preparation method thereof. Background technique [0002] The mercapto-ene photosensitive material refers to a material that is prone to polymerization reactions between monomers containing two or more mercapto groups (-SH) and monomers containing unsaturated carbon-carbon double bonds (-C=C-) under light. In the past 30 years, people have gradually discovered that mercapto-ene photopolymerization is different from the common free radical chain polymerization stepwise addition polymerization mechanism, which has the advantages of rapid reaction, insensitivity to oxygen, uniform polymer structure, excellent heat insulation, Many advantages such as high refractive index, oxidation inertness and water resistance. It is unique in the preparation of cross-linked ...

Claims

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Application Information

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IPC IPC(8): C09D181/02C08G75/045
Inventor 吕满庚管啸晓吴昆
Owner 国科广化(南雄)新材料研究院有限公司
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