GaN-based metal-ultrathin oxide-semiconductor composite structure nanolaser and preparation method thereof
A nano-laser, composite structure technology, applied in semiconductor lasers, lasers, laser parts and other directions, can solve the problems of metal-ultra-thin oxide-semiconductor composite structure problems, and achieve small optical mode volume and low lasing threshold. Effect
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Embodiment 1
[0050] The preparation method of the GaN-based metal-ultra-thin oxide-semiconductor composite structure nano-laser, the steps include:
[0051] (1) A layer of SiO is grown on the InGaN / GaN quantum well epitaxial wafer 2 For the insulating layer, spin-coat PMMA glue and UV-curable glue on the surface of the insulating layer in sequence. The thickness of PMMA glue is 200nm, and the thickness of UV-curable glue is 30nm. The structure of the InGaN / GaN quantum well epitaxial wafer includes: a sapphire substrate layer , an n-type GaN layer 1 grown on the substrate layer, an In grown on the n-type GaN layer x Ga 1-x N / GaN quantum well active layer 2, grown on In x Ga 1-x The p-type AlGaN barrier layer and p-type GaN layer 3 on the N / GaN quantum well active layer, where x=0.23, the quantum well active layer emits light at a wavelength of 490nm, the number of periods of the quantum well is 10, and the p-type AlGaN barrier layer and the total thickness of the p-type GaN layer is 300...
Embodiment 2
[0062] The preparation method of the GaN-based metal-ultra-thin oxide-semiconductor composite structure nano-laser, the steps include:
[0063] (1) A layer of SiC insulating layer is grown on the InGaN / GaN quantum well epitaxial wafer, and PMMA glue and UV curing glue are spin-coated on the surface of the insulating layer in turn. The thickness of PMMA glue is 600nm, and the thickness of UV curing glue is 300nm. InGaN / GaN quantum In the well epitaxial wafer, x=0.35, the quantum well active layer emits light at a wavelength of 530nm, the number of periods of the quantum well is 15, and the total thickness of the p-type AlGaN barrier layer and the p-type GaN layer is 500nm;
[0064] (2) Using UV soft nanoimprinting technology, a soft template is used to form a large-area ordered nano-elliptical column array on the UV-cured adhesive layer. The long-axis diameter of the nano-elliptical column is 240nm, the short-axis diameter is 160nm, and the period is 550nm. , arranged in hexago...
Embodiment 3
[0074] The preparation method of the GaN-based metal-ultra-thin oxide-semiconductor composite structure nano-laser, the steps include:
[0075] (1) A layer of SiC insulating layer is grown on the InGaN / GaN quantum well epitaxial wafer, PMMA glue and UV curing glue are spin-coated on the surface of the insulating layer in turn, the thickness of PMMA glue is 400nm, and the thickness of UV curing glue is 150nm. InGaN / GaN quantum In the well epitaxial wafer, x=0.20, the light emission wavelength of the active layer of the quantum well is 480nm, the period number of the quantum well is 12, and the total thickness of the p-type AlGaN barrier layer and the p-type GaN layer is 400nm;
[0076](2) Using UV soft nanoimprinting technology, a soft template is used to form a large-area ordered nano-elliptical column array on the UV-cured adhesive layer. The long-axis diameter of the nano-elliptical column is 240nm, the short-axis diameter is 160nm, and the period is 550nm. , arranged in hex...
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