mask assembly

A component and mask technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of hollow pattern size change, low evaporation cover life, etc., to save damage and reduce dimensional changes Effect

Active Publication Date: 2020-06-16
ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The main purpose of the present invention is to provide a mask assembly to solve the problems in the prior art that the life of the evaporation cover is low and the size of the hollow pattern in the evaporation cover has changed

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0038] The mask assembly provided by this embodiment is as figure 1 As shown, it includes a carbon fiber material layer and a first metal layer arranged on both sides of the carbon fiber material layer, wherein the carbon fiber material layer has a first hollow area, and the carbon fiber material layer is carbon fiber cloth (model is CFS-II-200) , the first metal layer has a second hollow area corresponding to the first hollow area, the thickness is 4 μm, and the first metal layer is a nickel layer, and the thickness of the mask component is 120 μm.

Embodiment 2

[0040] The difference between this embodiment and embodiment 1 is:

[0041] The first metal layer is iron platinum (FePt 53 ) alloy layer.

Embodiment 3

[0043] The difference between this embodiment and embodiment 2 is:

[0044] The first metal layer is an iron-nickel alloy layer.

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Abstract

The invention provides a mask assembly. The mask assembly comprises a carbon fiber material layer provided with a first hollow region, and a first metal layer which is arranged on the surface of at least one side of the carbon fiber material layer, wherein the first metal layer is provided with a second hollow region corresponding to the first hollow region. The carbon fiber material layer has the characteristics of low expansibility and high strength, so that the influence on the reliability of the mask assembly due to a temperature change in a process is reduced during application of the mask assembly, and a size change, which is caused by the temperature change, of a hollow pattern in the mask assembly is also reduced; meanwhile, the first metal layer enables the mask assembly to have a smooth surface, so that stacking of materials on the surface of the mask assembly in a preparation process of evaporation, sputtering or printing is avoided, and the subsequent scraping procedure for removing the stacked materials and damage caused by the scraping procedure are eliminated; and therefore, the mask assembly simultaneously meets the requirements for high strength and high precision.

Description

technical field [0001] The present invention relates to the technical field of masks, in particular to a mask component. Background technique [0002] At present, the evaporation cover used in the evaporation process mainly adopts the method of directly using a wire mesh or performing metal electroforming to form a screen. However, the above-mentioned methods all have the problem of dimensional stability. The fundamental reason is that due to the elasticity of metal or wire mesh materials, the above-mentioned materials will have a certain amount of deformation or elastic fatigue during the evaporation process with the use time and temperature. Phenomena, which lead to a reduction in the life of the evaporation cover, or a corresponding difference in the size of the hollow pattern in the evaporation cover, especially in the production of large-area components, a small amount of dimensional changes will cause the cumulative change of the overall area to exceed design error. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/044C23C14/24
Inventor 周淑金
Owner ZHANGJIAGANG KANGDE XIN OPTRONICS MATERIAL
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