Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

A bismuth phosphate thin film with photoresponse properties and its preparation method and application

A technology of bismuth phosphate and photoresponse, which is applied in the direction of phosphate, phosphorus oxyacid, chemical instruments and methods, etc., can solve the problem of small powder particle size, achieve good uniformity, overcome difficulties in recycling, Equipment requires simple effects

Active Publication Date: 2019-07-23
SHAANXI UNIV OF SCI & TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, researchers have synthesized BiPO through various ways 4 , such as solid phase reaction method, hydrothermal reaction method, binary solvothermal method and other methods, the materials prepared by the above methods are all powder materials, and powder has certain application prospects in photocatalytic degradation of organic matter, but powder The size of the bulk particles is too small, and there are certain technical difficulties in recycling, which is a shortcoming of the photodegradation of powder materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A bismuth phosphate thin film with photoresponse properties and its preparation method and application
  • A bismuth phosphate thin film with photoresponse properties and its preparation method and application
  • A bismuth phosphate thin film with photoresponse properties and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Step 1: The raw material Bi(NO 3 ) 3 Dissolve in ethylene glycol, make a 0.2mol / L solution, record it as solution A, add Na 3 PO 4 Dissolve it in ethylene glycol and prepare it as a 0.2mol / L solution, denoted as solution B; according to the molar ratio of Bi to P as 1:1, slowly drop solution B into solution A and stir vigorously. White precipitate, dropwise add concentrated nitric acid with a concentration of 1mol / L to it until the precipitate is eliminated and the configuration becomes colorless and clear BiPO 4 Solution, continue to stir for 1h to make it evenly mixed to obtain BiPO 4 Precursor solution; BiPO 4 The precursor solution is allowed to stand for 12 hours to obtain colorless and clear BiPO 4 Sol (it remains colorless and clear after aging for 12 hours);

[0029] Step 2: Clean the cut FTO glass substrate and irradiate it under ultraviolet light to make the surface of the FTO glass substrate achieve atomic cleanliness;

[0030] Step 3: Use a spinning rate of 4000r / ...

Embodiment 2

[0033] Step 1: The raw material Bi(NO 3 ) 3 Dissolve in ethylene glycol, make a 0.2mol / L solution, record it as solution A, add Na 3 PO 4 Dissolve it in ethylene glycol and prepare it as a 0.2mol / L solution, denoted as solution B; according to the molar ratio of Bi to P as 1:1, slowly drop solution B into solution A and stir vigorously. White precipitate, dropwise add concentrated nitric acid with a concentration of 1mol / L to it until the precipitate is eliminated and the configuration becomes colorless and clear BiPO 4 Solution, continue to stir for 1h to make it evenly mixed to obtain BiPO 4 Precursor solution; BiPO 4 The precursor solution is allowed to stand for 12 hours to obtain colorless and clear BiPO 4 Sol (it remains colorless and clear after aging for 12 hours);

[0034] Step 2: Clean the cut FTO glass substrate and irradiate it under ultraviolet light to make the surface of the FTO glass substrate achieve atomic cleanliness;

[0035] Step 3: Use a spinning rate of 4000r / ...

Embodiment 3

[0038] Step 1: The raw material Bi(NO 3 ) 3 Dissolve in ethylene glycol, make a 0.19mol / L solution, record it as solution A, add Na 3 PO 4 Dissolve in ethylene glycol and prepare it as a 0.19mol / L solution, denoted as solution B; according to the molar ratio of Bi to P as 1:1, slowly drop solution B into solution A and stir vigorously. White precipitate, dropwise add concentrated nitric acid with a concentration of 1mol / L to it until the precipitate is eliminated and the configuration becomes colorless and clear BiPO 4 Solution, continue to stir for 1.1h to make it evenly mixed to obtain BiPO 4 Precursor solution; BiPO 4 The precursor solution is allowed to stand for 12 hours to obtain colorless and clear BiPO 4 Sol (it remains colorless and clear after aging for 12 hours);

[0039] Step 2: Clean the cut FTO glass substrate and irradiate it under ultraviolet light to make the surface of the FTO glass substrate achieve atomic cleanliness;

[0040] Step 3: Use a spin coating rate of 3...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
photoelectricityaaaaaaaaaa
Login to View More

Abstract

The invention discloses a bismuth phosphate thin film with photoresponse characteristic, and a preparation method and application thereof. Bi(NO3)3 and Na3PO4 are respectively dissolved in ethylene glycol to be prepared into a solution A and a solution B in certain concentration; the solution B is slowly and dropwise added into the solution A; a certain amount of concentrated nitric acid is added; a colorless clear BiPO4 precursor solution is obtained; after precursor solution ageing, colorless clear BiPO4 sol is obtained. A monoclinic phase structure BiPO4 thin film with photoresponse characteristic is prepared on a conducting glass substrate by a layer-by-layer annealing process and a spin-coating method of a sol-gel method. The equipment requirements are simple; the experiment conditions are mild; the prepared sol can keep stable for a long time; the sol concentration is precise and controllable; the photocurrent of the prepared BiPO4 thin film reaches 0.861 to 0.934mA / cm<2> under simulated sunlight; the thin film can be used for the organic pollutant degradation aspect.

Description

Technical field [0001] The invention belongs to the field of functional materials, and specifically relates to a monoclinic BiPO with light response characteristics prepared on the surface of a conductive glass substrate 4 Methods and applications of thin films. Background technique [0002] BiPO 4 It is a wide band gap semiconductor material with a band gap of approximately 4.1 eV and a good UV response. It can be used as a photocatalytic material to degrade organic pollutants in industrial wastewater. BiPO 4 When irradiated by ultraviolet light, electrons can transition from the valence band to the conduction band, leaving vacancies in the valence band. The photogenerated electrons and holes are combined with O 2 And surface OH - Combines to form oxidizing superoxide radical·O 2 - And hydroxyl radicals·OH, etc., superoxide radicals and hydroxyl radicals can decompose organic molecules in water to achieve the effect of degradation. Currently, researchers have synthesized BiPO th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34C02F1/30B01J27/186B01J35/02C01B25/26C02F101/30
CPCY02W10/37
Inventor 谈国强苏宇宁许驰赵程程夏傲
Owner SHAANXI UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com