Moisturizing and repairing facial mask and preparation method thereof

Abstract

The invention discloses a moisturizing and repairing facial mask. The moisturizing and repairing facial mask contains the following components in parts by weight: 1-2 parts of hyaluronic acid, 2-6 parts of human-like collagen, 2-5 parts of corallina officinalis extract, 3-8 parts of tremella extract, 2-5 parts of centella asiatica extract, 1-5 parts of glycerol, 0.5-1.5 parts of propylene glycol, 1-2 parts of vitamin E, 0.1-0.3 part of phenoxyethanol and 80-90 parts of water. The moisturizing and repairing facial mask disclosed by the invention contains multiple plant extracts and has excellent moisturizing effect; the human-like collagen has the efficacy of repairing damaged skin; a biological fiber membrane cloth can fully absorb essence, the absorbed essence hardly volatilizes, the membrane cloth fitting degree of the membrane cloth with the skin is extremely high, and after all kinds of functional ingredients are fused into the membrane cloth of the facial mask, good effect can be brought to the skin.

Description

Technical field [0001] The invention relates to the technical field of cosmetics, in particular to a moisturizing and repairing facial mask and a preparation method thereof. Background technique [0002] With the increase of age and life pressure, people's facial skin will gradually begin to appear dry, fine lines and other problems. The lack of skin will accelerate the aging of the skin, so moisturizing skin care products are needed to regulate the moisture of the skin. [0003] The mask is to use the time of covering the face to isolate the external air and pollution, promote the expansion of skin pores, accelerate the metabolism, and increase the oxygen content of the skin; the nutrients in the mask penetrate into the stratum corneum of the skin epidermis, making the skin become soft. Most of the moisturizing facial masks currently on the market have the disadvantages of low absorption, easy dripping, slow absorption, and excessive residual essence when applying on the face. S...

AI Technical Summary

Problems solved by technology

Most of the moisturizing masks currently on the market have low absorption, easy dripping, slow absorption and excessive residual essence when applying to the face.