Electrolytic reaction system and cupric chloride etchant regeneration and copper extraction technology

A technology of electrolytic reaction and electrolytic cell, applied in the field of electrolysis, can solve problems such as inability to achieve online circulation and increase equipment costs

Inactive Publication Date: 2017-08-18
广州合凯环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the actual situation is that such equipment currently in use cannot achieve full online circulation, and no less than half of the etching solution is discharged after copper extraction and cannot be fully regenerated. Chlorine, chlorine gas is a poisonous gas, in order to prevent the harm of chlorine gas, the system has added ferrous absorption and alkali absorption devices for chlorine gas, these devices not only increase the cost of equipment, but also generate new hazardous waste when used, these newly added hazardous waste In addition to the half of the waste etching solution discharged earlier, the total amount of waste has exceeded the total amount of etching waste, which runs counter to the purpose of environmental protection

Method used

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  • Electrolytic reaction system and cupric chloride etchant regeneration and copper extraction technology
  • Electrolytic reaction system and cupric chloride etchant regeneration and copper extraction technology
  • Electrolytic reaction system and cupric chloride etchant regeneration and copper extraction technology

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Embodiment

[0042] Place the waste etching solution to be regenerated in the cathode chamber 11; place dilute sulfuric acid in the anode chamber 12, and set the concentration of dilute sulfuric acid at 20-25%, with the oxygen evolution type DSA iridium titanium plate as the anode plate 15, and the titanium electrode plate As the cathode plate 14, each anode chamber 12 is surrounded by a 0.6mm thick CR61CMP-447 cationic membrane, connected to the power supply, at 4A / dm 2 Electrolysis was performed at a current density. During the electrolysis process, the catholyte and the anolyte are continuously circulated respectively.

[0043] The chemical reaction process of the above electrolysis process is the anode: OH --e→O 2 ; Cathode: Cu 2+ +e → Cu.

[0044] There are some monovalent copper ions in the etching waste liquid, and the oxygen precipitated in the anode is introduced into the cathode solution through the catheter to oxidize the monovalent copper ions to divalent copper ions: Cu +...

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Abstract

The invention relates to the technical field of electroplating, in particular to an electrolytic reaction system and a cupric chloride etchant regeneration and copper extraction technology. The electrolytic reaction system comprises an electrolytic cell, a cathode chamber for containing a cathode plate and an anode chamber for containing an anode plate are arranged in the electrolytic cell, the anode chamber is surrounded by a positive ion film, and the cathode chamber and the anode chamber are isolated through the positive ion film; etching waste liquid is contained in the cathode chamber, and dilute sulphuric acid is contained in the anode chamber. The invention further discloses the technology for conducting cupric chloride etchant regeneration and copper extraction through the electrolytic reaction system. Due to existence of the positive ion film, Cl- cannot achieve migration of the anode, therefore, the anode cannot carry out discharging for chlorine forming, a regenerated etchant does not need to be supplemented for chlorine ions again, meanwhile, only water needs to be supplemented in the whole operation process, the system does not need to be supplemented for other absorbing devices and absorbing materials, and the technology process is more environment-friendly and energy-saving.

Description

technical field [0001] The invention relates to the technical field of electrolysis, in particular to an electrolysis reaction system, acid etching solution regeneration and copper extraction process. Background technique [0002] The circuit etching process in the circuit board industry will produce a large amount of etching waste liquid. The etching waste liquid is a hazardous waste strictly controlled by the state, containing heavy metals, acids and oxidants. The heavy metals are mainly copper, and the copper content can reach up to 160 grams per liter. The current general practice is to transport these waste liquids by vehicles from units with hazardous waste business licenses to our factory for treatment, recover copper, and discharge the tail liquid after sewage treatment. The copper extraction processes are mainly neutralization and replacement methods. It is a chemical method, and new chemical materials need to be added while extracting copper, which causes great har...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C1/12C25C7/00
CPCC23F1/46C25C1/12C25C7/00
Inventor 章平传
Owner 广州合凯环保科技有限公司
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