Developing unit and developing method
A developing device and a developing method technology, applied in optics, instruments, nonlinear optics, etc., can solve problems such as insufficient pattern refinement, reduced developer concentration, and pattern burrs, and meet the requirements of ensuring line width uniformity and avoiding The effect of uneven line width and improved fineness
Inactive Publication Date: 2017-08-18
BOE TECH GRP CO LTD +1
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Problems solved by technology
The disadvantages of traditional developing equipment are that the spray system cannot be evenly distributed over the moving glass substrate, and the inclination angle between the abutment and the horizontal plane remains unchanged. During the developing process, the developer is sprayed onto the glass substrate, among which the The developer solution on the upper side of the glass substrate reacts with the photoresist to reduce its concentration, and the developer solution with reduced concentration flows to the lower side of the glass substrate, so that the developer solution sprayed directly on the lower side of the glass substrate is diluted , resulting in a decrease in the concentration of the developer that chemically reacts with the photoresist on the lower side of the glass substrate
The line width of the photolithographic pattern prepared by this developing method is not uniform, and the line width of the photolithographic pattern gradually becomes wider from the upper side of the glass substrate to its lower side, and when the color resist material has requirements for developing precision , the pattern obtained by development will have burrs, or the pattern is not refined enough, and it is difficult to meet the requirements of high-resolution products
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[0055] Example embodiments will now be described more fully with reference to the accompanying drawings. Example embodiments may, however, be embodied in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus their detailed descriptions will be omitted.
[0056] refer to figure 1 As shown, the developing device of the present invention includes a first rotating base 5 and a first spraying mechanism 6, and the first rotating base 5 and the first spraying mechanism 6 are arranged in the developing area. The first carrying plane 52 of the first rotary base 5 is rotatable and inclined, and the first carrying plane 52 is used for carrying the glass substrate 11 to be developed. Th...
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The invention provides a developing device and a developing method. The developing device comprises a first rotary base platform and a first spraying mechanism; the first rotary base platform is arranged on a developing area, a first bearing plane of the first rotary base platform can rotate and is aslant arranged, and the first bearing platform is used for bearing a glass substrate to be developed; a spraying surface of the first spraying mechanism is arranged opposite to the first bearing plane, and the first spraying mechanism is used for spraying developing liquor to the glass substrate. According to the developing device and the developing method, the problem that a photoetching picture is not uniform in line width caused when the developing liquor at the lower broadside is diluted can be avoided, and thus the fineness is improved.
Description
technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a developing device and a developing method. Background technique [0002] TFT-LCD (Thin film Transistor Liquid Crystal Display, thin film transistor liquid crystal display) has the characteristics of small size, low power consumption, and no radiation, and occupies a mainstream position in the current flat panel display market. Among them, since the TFT array substrate is an important part of the TFT-LCD display, improving the yield of the TFT array substrate and reducing the number of reworks in the preparation process of the TFT array substrate can improve the display quality. [0003] In the production process of the TFT array substrate, the formation of the pattern needs to go through processes such as coating, exposure, and development. The general development process is that the abutment is at a fixed angle to the horizontal plane, and there is a set of spra...
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IPC IPC(8): G03F7/30G02F1/13
CPCG03F7/30G02F1/1303
Inventor 吴春晖余世荣蒋盛超安予生喻琨
Owner BOE TECH GRP CO LTD