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Antifouling ultra-hard anti-radiation glass and preparation method thereof

An anti-radiation and anti-fouling technology, applied in the direction of coating, etc., can solve the problems of small application range, poor anti-fouling effect, ineffective combination of hardness and anti-radiation, etc., to achieve the effect of ensuring the use effect and the service life

Inactive Publication Date: 2017-10-17
沈阳
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] This method and the technology in the prior art will not be able to effectively combine hardness and radiation protection, the scope of application is small, and the antifouling effect is poor

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] An anti-pollution ultra-hard anti-radiation glass, including a glass substrate, a number of "S"-shaped holes and "O"-shaped holes are opened on the upper surface of the glass substrate, the "S"-shaped holes and "O"-shaped holes are adjacent, and the colloid is filled in the " In the S”-shaped hole and the “O”-shaped hole, the refractive index of the colloid is the same as that of the glass substrate, and the glass substrate is provided with the first titanium dioxide layer from bottom to top, with a thickness of 15nm; aluminum oxide is used as a nano-buffer layer, with a thickness of 15nm. 8nm, second titanium dioxide layer, thickness 66nm; first Co-Ni-Cr-Al-Y film layer, thickness 4nm; Ag film layer, thickness 4.5nm; second Co-Ni-Cr-Al-Y film layer, thickness 42nm; silicon oxide as transition layer, thickness 38nm; silicon nitride as buffer nanolayer, thickness 9nm; carbon nitride nanolayer, thickness 22nm; Coating of silicon coating material, coating the photocatalyst...

Embodiment 2

[0051] The difference between this embodiment and Embodiment 1 is that the colloid in this embodiment is epoxy resin. Add 1% acetic acid by volume in the step (7), it is proved by experiments that the quality of the glass will change qualitatively, the anti-radiation layer is not easy to scratch, and the hardness is also greatly strengthened. Compared with Example 1, under the same experimental conditions, the hardness of the radiation protection layer in this embodiment is increased by 50-63%, and the service life of the radiation protection layer is more than doubled.

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PUM

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Abstract

The invention discloses antifouling ultra-hard anti-radiation glass which comprises a glass substrate. A plurality of S-shaped holes, O-shaped holes and colloid are arranged on the upper surface of the glass substrate, refractive index of the colloid is identical with that of the glass substrate, a first titanium dioxide layer of 15nm in thickness, aluminum oxide serving as a nano buffer layer and of 8nm in thickness, a second titanium dioxide layer of 66nm in thickness, a first Co-Ni-Cr-Al-Y coating of 4nm in thickness, a Ag coating of 4.5nm in thickness, a second Co-Ni-Cr-Al-Y coating of 42nm in thickness, silicon oxide serving as a transition layer and of 38nm in thickness and a carbon nitride nano layer of 22nm in thickness are arranged sequentially on the glass substrate from bottom to top, and the carbon nitride nano layer is coated with a coating material containing titanium dioxide-silicon dioxide having a photocatalysis function. The invention further discloses a preparation method of the antifouling ultra-hard anti-radiation glass. The antifouling ultra-hard anti-radiation glass is low in manufacturing cost, simple in structure and ultrahigh in hardness and has an anti-radiation function and antifouling effect.

Description

technical field [0001] The invention belongs to the technical field of glass, and relates to an anti-pollution superhard anti-radiation glass and a preparation method thereof. Background technique [0002] In order to enhance the surface strength of glass, for example, it can be achieved by forming a composite layer through coating, etc. In the prior art, silicon nitride coating is used to modify the strength of glass, but it still cannot meet the requirements in special application fields. High glass has become a demand, and the selection and application of materials have always been the bottleneck restricting the further development of this technology. [0003] Chinese patent, patent number: 201410310367.3, discloses an anti-scratch superhard glass and its preparation method, including a glass substrate, a buffer nano-layer is arranged on the glass substrate, a nano-transition layer is arranged on the nano-buffer layer, and nitrogen is arranged on the nano-transition layer...

Claims

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Application Information

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IPC IPC(8): C03C17/36C03C23/00
CPCC03C17/36C03C17/3626C03C17/3639C03C17/3644C03C17/3649C03C23/00C03C2218/156
Inventor 沈阳
Owner 沈阳
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