Antifouling ultra-hard anti-radiation glass and preparation method thereof
An anti-radiation and anti-fouling technology, applied in the direction of coating, etc., can solve the problems of small application range, poor anti-fouling effect, ineffective combination of hardness and anti-radiation, etc., to achieve the effect of ensuring the use effect and the service life
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Embodiment 1
[0033] An anti-pollution ultra-hard anti-radiation glass, including a glass substrate, a number of "S"-shaped holes and "O"-shaped holes are opened on the upper surface of the glass substrate, the "S"-shaped holes and "O"-shaped holes are adjacent, and the colloid is filled in the " In the S”-shaped hole and the “O”-shaped hole, the refractive index of the colloid is the same as that of the glass substrate, and the glass substrate is provided with the first titanium dioxide layer from bottom to top, with a thickness of 15nm; aluminum oxide is used as a nano-buffer layer, with a thickness of 15nm. 8nm, second titanium dioxide layer, thickness 66nm; first Co-Ni-Cr-Al-Y film layer, thickness 4nm; Ag film layer, thickness 4.5nm; second Co-Ni-Cr-Al-Y film layer, thickness 42nm; silicon oxide as transition layer, thickness 38nm; silicon nitride as buffer nanolayer, thickness 9nm; carbon nitride nanolayer, thickness 22nm; Coating of silicon coating material, coating the photocatalyst...
Embodiment 2
[0051] The difference between this embodiment and Embodiment 1 is that the colloid in this embodiment is epoxy resin. Add 1% acetic acid by volume in the step (7), it is proved by experiments that the quality of the glass will change qualitatively, the anti-radiation layer is not easy to scratch, and the hardness is also greatly strengthened. Compared with Example 1, under the same experimental conditions, the hardness of the radiation protection layer in this embodiment is increased by 50-63%, and the service life of the radiation protection layer is more than doubled.
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