High-strength photosensitive developing resin for plasma display screen electrodes
A technology of plasma display screen and developing resin, which is applied in gas discharge electrodes, photosensitive materials used in optomechanical equipment, optics, etc., can solve the problem of low resolution and achieve high resolution, excellent photosensitivity and developing performance.
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Embodiment 1
[0015] Example 1 A high-strength photosensitive developing resin for plasma display electrodes, which is composed of the following raw materials in parts by weight: 300 parts of resin copolymer, 320 parts of solvent, 45 parts of surfactant, 32 parts of photopolymerization initiator and disinfectant Foam agent 35 parts.
[0016] The resin copolymer is composed of acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, Composed of phenolic resin and amino resin.
[0017] The resin copolymer is acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, phenolic It is obtained by copolymerization reaction after mixing resin and amino resin.
[0018] The temperature during the copolymerization reaction is 50-200°C, pr...
Embodiment 2
[0023] Example 2 A high-strength photosensitive developing resin for plasma display electrodes, which is composed of the following raw materials in parts by weight: 400 parts of resin copolymer, 480 parts of solvent, 55 parts of surfactant, 40 parts of photopolymerization initiator and disinfectant Foam agent 40 parts.
[0024] The resin copolymer is composed of acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, Composed of phenolic resin and amino resin.
[0025] The resin copolymer is acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, phenolic It is obtained by copolymerization reaction after mixing resin and amino resin.
[0026] The temperature during the copolymerization reaction is 50-200°C, pr...
Embodiment 3
[0031] Example 3 A high-strength photosensitive developing resin for plasma display electrodes, which is composed of the following raw materials in parts by weight: 360 parts of resin copolymer, 400 parts of solvent, 50 parts of surfactant, 36 parts of photopolymerization initiator and disinfectant Foam agent 38 parts.
[0032] The resin copolymer is composed of acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, Composed of phenolic resin and amino resin.
[0033] The resin copolymer is acrylate, polyvinyl chloride, polyolefin, styrene, polyurethane, polyamide, polycarbonate, polyoxymethylene, polyphenylene ether, polytetrafluoroethylene, epoxy resin, unsaturated polyester, phenolic It is obtained by copolymerization reaction after mixing resin and amino resin.
[0034] The temperature during the copolymerization reaction is 50-200°C, pr...
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