Oxide/metal core-shell structure quantum dot and preparation method and application thereof
An oxide shell, quantum dot technology, applied in chemical instruments and methods, nanotechnology for materials and surface science, electrical components, etc., can solve the problems of complex process, unfavorable industrial production, poor process continuity, etc. Improve luminous efficiency, realize thin-film LED devices, and promote the effect of lateral growth
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Embodiment 1
[0034] A preparation method of oxide / metal core-shell structure quantum dots, comprising the following steps:
[0035] (1) Substrate treatment: Put the P-type substrate into deionized water, and ultrasonically clean it at room temperature for 5 minutes to remove the dirt particles on the surface of the P-type substrate, and then wash it with hydrochloric acid, acetone, and ethanol in sequence to remove the surface organic matter. Blow dry with high-purity dry nitrogen, and place the P-type substrate in a vacuum chamber with a vacuum degree of 8.6×10 -8 Pa, annealing at 700°C for 30 minutes to remove residual carbides on the substrate surface to obtain a clean and flat surface;
[0036] (2) Preparation of metal ultra-thin film: under high vacuum conditions with a temperature of 250°C, the vacuum degree is 4×10 -6 Pa, adopting thermal evaporation to deposit a 3nm thick Pt ultrathin film on the P-type substrate processed through step (1);
[0037] (3) Preparation of metal quant...
Embodiment 2
[0041]A preparation method of oxide / metal core-shell structure quantum dots, comprising the following steps:
[0042] (1) Substrate treatment: Put the substrate into deionized water, ultrasonically clean it at room temperature for 5 minutes, remove the dirt particles on the surface of the substrate, and then wash it with hydrochloric acid, acetone, and ethanol in sequence to remove surface organic matter, and dry it with high-purity Blow dry with nitrogen, place the substrate in a vacuum chamber with a vacuum degree of 8.7×10 -8 Pa, annealing at 750°C for 50 minutes to remove residual carbides on the substrate surface to obtain a clean and flat surface;
[0043] (2) Preparation of metal ultra-thin film: under high vacuum conditions with a temperature of 450°C, the vacuum degree is 9.8×10 -7 Pa, adopt thermal evaporation method to deposit a layer of 3nm thick Ag ultrathin film on the substrate processed through step (1);
[0044] (3) Preparation of metal quantum dots: under h...
Embodiment 3
[0047] A preparation method of oxide / metal core-shell structure quantum dots, comprising the following steps:
[0048] (1) Substrate treatment: Put the substrate into deionized water, ultrasonically clean it at room temperature for 5 minutes, remove the dirt particles on the surface of the substrate, and then wash it with hydrochloric acid, acetone, and ethanol in sequence to remove surface organic matter, and dry it with high-purity Blow dry with nitrogen, place the substrate in a vacuum chamber with a vacuum degree of 7.6×10 -8 Pa, annealing at 1000°C for 100 minutes to remove residual carbides on the surface of the substrate to obtain a clean and flat surface;
[0049] (2) Preparation of metal ultra-thin film: under high vacuum conditions with a temperature of 500°C, the vacuum degree is 9×10 -7 Pa, adopt thermal evaporation to deposit a layer of 10nm thick Mn ultra-thin film on the substrate processed through step (1);
[0050] (3) Preparation of metal quantum dots: unde...
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