Crossed tapered quantum dot as well as preparation method and application thereof

A quantum dot and cone technology, applied in the field of cross-cone quantum dots and their preparation, can solve the problems of complex process, unfavorable industrial production, poor process continuity, etc., and achieve the effect of improving luminous efficiency, wide application range and improving performance.

Active Publication Date: 2018-02-27
WUYI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods are complicated in technology, poor in continuity of operation, and unfavorable for suitability for industrialized production

Method used

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  • Crossed tapered quantum dot as well as preparation method and application thereof
  • Crossed tapered quantum dot as well as preparation method and application thereof
  • Crossed tapered quantum dot as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A preparation method for cross-conical quantum dots, comprising the following steps:

[0039] (1) Prepare a placeable NiO / substrate and SiO 2 The concave mold of the nano-microsphere and the convex mold matched with it are ready for use; the depth of the concave mold is slightly greater than the sum of the thickness of the substrate, the diameter of the nano-microsphere and the height of the convex mold;

[0040] (2) Put the substrate into deionized water, ultrasonically clean it at room temperature for 3-5 minutes, remove the dirt particles on the surface of the substrate, and then wash it with acetone and ethanol in sequence to remove the organic matter on the surface, and dry it with a spin dryer;

[0041] (3) Place the substrate in the concave mold, and then spread a layer of SiO with a diameter of 300nm on the substrate 2 Nano microspheres, the nano microspheres just cover the upper surface of the substrate;

[0042] (4) Spray the Pt metal mask material on the co...

Embodiment 2

[0047]A preparation method for cross-conical quantum dots, comprising the following steps:

[0048] (1) Prepare a placeable NiO / substrate and SnO 2 The concave mold of the nano-microsphere and the convex mold matched with it are ready for use; the depth of the concave mold is slightly greater than the sum of the thickness of the substrate, the diameter of the nano-microsphere and the height of the convex mold;

[0049] (2) Put the substrate into deionized water, ultrasonically clean it at room temperature for 3-5 minutes, remove the dirt particles on the surface of the substrate, and then wash it with acetone and ethanol in sequence to remove the organic matter on the surface, and dry it with a spin dryer;

[0050] (3) The substrate is placed in the concave mold, and then a layer of SnO with a diameter of 350nm is spread on the substrate. 2 Nano microspheres, the nano microspheres just cover the upper surface of the substrate;

[0051] (4) Evaporate Al metal mask material on...

Embodiment 3

[0055] A preparation method for cross-conical quantum dots, comprising the following steps:

[0056] (1) Prepare a concave mold that can place NiO / substrate and ZnO nano microspheres and a convex mold that fits with it, for subsequent use; the depth of the concave mold is slightly greater than the thickness of the substrate, the diameter of the nanospheres and the convex mold. The sum of the height of the mold;

[0057] (2) Put the substrate into deionized water, ultrasonically clean it at room temperature for 3-5 minutes, remove the dirt particles on the surface of the substrate, and then wash it with acetone and ethanol in sequence to remove the organic matter on the surface, and dry it with a spin dryer;

[0058] (3) The substrate is placed in the concave mold, and then a layer of ZnO nanospheres with a diameter of 500nm is spread on the substrate, and the nanospheres just cover the upper surface of the substrate;

[0059] (4) Evaporate Ni metal mask material on the concav...

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Abstract

The invention discloses a crossed tapered quantum dot. The crossed tapered quantum dot comprises a substrate and a crossed tapered quantum dot body which are arrayed in sequence from bottom to top. The invention further discloses a preparation method and application of the crossed tapered quantum dot. The crossed tapered quantum dot prepared by the preparation method has the characteristics of controllable size, good distribution uniformity and the like; the preparation method has the advantages of simple growth technology and low cost.

Description

technical field [0001] The invention belongs to the technical field of semiconductor quantum dot materials, in particular to a cross-conical quantum dot and its preparation method and application. Background technique [0002] As a new type of solid-state lighting source and green light source, light diode (LED) has outstanding features such as small size, low power consumption, environmental protection, long service life, high brightness, low heat and colorful, and is widely used in outdoor lighting, commercial lighting and decoration Engineering and other fields have a wide range of applications. At present, under the background of the increasingly serious problem of global warming, saving energy and reducing greenhouse gas emissions has become an important issue faced by the whole world. A low-carbon economy based on low energy consumption, low pollution, and low emissions will become an important direction of economic development. In the field of lighting, the applicat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/87C09K11/64C09K11/60B82Y20/00B82Y40/00H01L33/06H01L31/0352
CPCH01L31/035218H01L33/06C09K11/60C09K11/64C09K11/87B82Y20/00B82Y40/00
Inventor 杨为家刘铭全刘俊杰刘均炎何鑫唐秀凤曾庆光
Owner WUYI UNIV
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