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Manufacturing method of target blank and target assembly

A manufacturing method and technology of target blanks, which are applied in the field of sputtering targets, can solve the problems that the sputtering performance of target components needs to be improved, and achieve the effects of improving heating uniformity, uniform crystal orientation, and improving sputtering performance

Active Publication Date: 2018-03-06
KONFOONG MATERIALS INTERNATIONAL CO LTD
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Problems solved by technology

[0004] However, the sputtering performance of the target assembly formed by the prior art needs to be improved

Method used

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  • Manufacturing method of target blank and target assembly
  • Manufacturing method of target blank and target assembly
  • Manufacturing method of target blank and target assembly

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Embodiment Construction

[0026] AlSc alloys are gradually used in the manufacture of target blanks because of their superior properties such as corrosion resistance, mechanical strength, toughness, heat resistance, plasticity and weldability. In the manufacturing process of the target blank, the current heat treatment method for the AlSc alloy ingot is mainly: placing the AlSc alloy ingot in a heating furnace, and performing heat treatment on the AlSc alloy ingot.

[0027] However, in the heat treatment process, it is difficult to ensure that the temperature in the heating furnace is stable, and it is difficult to ensure that the AlSc alloy ingot is heated evenly, thus causing the microstructure of the AlSc alloy ingot to be inconsistent in the transverse and longitudinal directions due to uneven heating, The crystal orientation uniformity and grain size uniformity of the formed target blank are poor, which makes it difficult for the formed target blank to meet the requirements of target sputtering.

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Abstract

The invention provides a manufacturing method of a target blank and a target assembly. The manufacturing method of the target blank comprises the following steps: providing an AlSc alloy ingot; performing plastic deformation processing on the AlSc alloy ingot to form an initial target blank; and performing thermal treatment on the initial target blank by way of stepped temperature rise to form thetarget blank. By way of stepped temperature rise, thermal treatment is performed on the initial target blank. As the good heating uniformity of the initial target blank is hardly guaranteed in the temperature rise process, thermal treatment is performed in multiple stages; insulation is performed after temperature rise every time, so that the initial target blank in part of region reaching the predetermined temperature is insulated, and the initial target blank in part of region not reaching the predetermined temperature is heated continuously till the predetermined temperature is reached. Therefore, after thermal treatment of every stage, the initial target blank can be uniformly heated, that is, the heating uniformity of the initial target blank can be improved, so that the crystal orientation <200> content of the target blank after thermal treatment is increased, and the target blank is uniform in crystal orientation and small in grain size.

Description

technical field [0001] The invention relates to the technical field of sputtering targets, in particular to a method for manufacturing a target blank and a target component. Background technique [0002] In the field of sputtering target manufacturing, the target assembly is composed of a target blank that meets the sputtering performance and a back plate that is combined with the target blank by welding. The production process of the target blank generally includes: melting, homogenization treatment, plastic deformation processing, heat treatment, mechanical processing and other steps. On the basis of strictly controlling the purity of the target blank, by selecting different plastic deformation processing and heat treatment conditions, adjusting the grain orientation and grain size of the target blank, and finally forming a target blank that meets the sputtering requirements. [0003] In particular, heat treatment is an indispensable process in the process of target blank...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34
CPCC23C14/3414
Inventor 姚力军潘杰相原俊夫王学泽陈勇军
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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