Polyurethane grinding pad and manufacturing method thereof
A polishing pad and polyurethane technology, applied in the polishing field, can solve the problems of difficulty in meeting the integration of integrated circuits, affecting polishing efficiency, scratching the polishing surface, etc., and achieving stable polishing effect, improving polishing efficiency, and reducing scratches.
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[0042] Example 1:
[0043] See figure 1 As shown, a polyurethane polishing pad includes a polishing layer 1 obtained by reacting an isocyanate-terminated prepolymer, a curing agent composition, and hollow microspheres, wherein the amino group in the curing agent composition and the unreacted NCO in the prepolymer The molar ratio is 85:100, the average pore diameter of the polishing layer is 10μm, and the number of surface micropores is 200 / mm 2 , The roughness is 5μm. The surface of the polishing layer 1 is provided with a first groove 2 with a concentric pattern with the center of the polishing layer 1 as the center. The cross section of the first groove 2 is rectangular, and the bottom of the first groove 2 has a lubricating coating 4 , Wherein, the lubricating coating 4 is a fluorine-containing polyol, the fluorine-containing polyol includes aliphatic fluorine-containing polyol, the aliphatic fluorine-containing polyol contains 6 carbon atoms, and the aliphatic fluorine-contain...
Example Embodiment
[0044] Example 2:
[0045] See figure 1 As shown, a polyurethane polishing pad includes a polishing layer 1 obtained by reacting an isocyanate-terminated prepolymer, a curing agent composition, and hollow microspheres, wherein the amino group in the curing agent composition and the unreacted NCO in the prepolymer The molar ratio is 95:100, the average pore diameter of the polishing layer is 80μm, and the number of surface micropores is 800 / mm 2 , The roughness is 15μm, the surface of the polishing layer 1 is provided with a first groove 2 with a concentric pattern centered on the center of the polishing layer 1. The cross section of the first groove 2 is rectangular, and the bottom of the first groove 2 has a lubricating coating Layer 4, where the lubricating coating 4 is a fluorine-containing polyol, the fluorine-containing polyol includes aliphatic fluorine-containing polyol, the aliphatic fluorine-containing polyol contains 14 carbon atoms, and the aliphatic fluorine-containing...
Example Embodiment
[0046] Example 3:
[0047] See figure 1 As shown, a polyurethane polishing pad includes a polishing layer 1 obtained by reacting an isocyanate-terminated prepolymer, a curing agent composition, and hollow microspheres, wherein the amino group in the curing agent composition and the unreacted NCO in the prepolymer The molar ratio is 90:100, the average pore diameter of the polishing layer is 50μm, and the number of surface micropores is 500 / mm 2 , The roughness is 10μm, the surface of the polishing layer 1 is provided with a first groove 2 with a concentric pattern centered on the center of the polishing layer 1. The cross section of the first groove 2 is rectangular, and the bottom of the first groove 2 has a lubricating coating Layer 4, where the lubricating coating 4 is a fluorine-containing polyol, the fluorine-containing polyol includes an aliphatic fluorine-containing polyol, the aliphatic fluorine-containing polyol contains 10 carbon atoms, and the aliphatic fluorine-contain...
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