High-temperature-resistant radar and infrared compatible stealth coating and preparation method thereof

A high-temperature-resistant, infrared technology, applied in coatings, devices for coating liquid on surfaces, and pre-treated surfaces, etc., can solve the problem of ensuring the uniform distribution of radar absorbers, the repeatability of microstructure, and the stability and reliability of coating quality Low performance, difficult engineering application and other issues

Active Publication Date: 2018-06-29
NAT UNIV OF DEFENSE TECH
View PDF2 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The single-type compatible stealth coating achieves high infrared reflection and high absorption of radar waves by adding radar absorbers to the infrared stealth coating, and by adjusting the structure and electromagnetic properties of the coating materi

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-temperature-resistant radar and infrared compatible stealth coating and preparation method thereof
  • High-temperature-resistant radar and infrared compatible stealth coating and preparation method thereof
  • High-temperature-resistant radar and infrared compatible stealth coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0056] A high temperature resistant radar and infrared compatible stealth coating of the present invention, the high temperature resistant radar and infrared compatible stealth coating is located on the metal substrate 6, the high temperature resistant radar and infrared compatible stealth coating is a layered structure, such as figure 2 As shown, from the inside to the outside, it includes a metal bonding layer 5 (CoCrAlY alloy coating), a ceramic absorbing layer 4 (Al 2 o 3 - Ni-based ceramic materials, Ni and Al 2 o 3 The mass ratio is 40:60), chip resistance type high temperature periodic structure layer 3, ceramic isolation layer 2 (8YSZ ceramic material) and infrared low emissivity frequency selective surface layer 1;

[0057] The chip resistance type high temperature periodic structure layer 3 is arranged with Bi 2 o 3 -SiO 2 -B 2 o 3 It is a high-temperature resistance coating with low melting point lead-free glass as the binding phase and molybdenum disilicide...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a high-temperature-resistant radar and infrared compatible stealth coating and a preparation method thereof. The high-temperature-resistant radar and infrared compatible stealth coating is of a layered structure, and sequentially comprises a metal bonding layer, a ceramic wave absorbing layer, a chip resistance type high-temperature periodic structure layer, a ceramic isolation layer and an infrared low-emissivity frequency selective surface layer from inside to outside; and the chip resistance type high-temperature periodic structure layer is a high-temperature resistance coating which is arranged in a periodic characteristic mode, and the infrared low-emissivity frequency selective surface layer is a high-temperature conductor coating which is arranged in a periodic characteristic mode. According to the radar and infrared compatible stealth coating, integration of the radar stealth function and the infrared stealth function is effectively achieved, the coating has both the radar stealth effect and the infrared stealth effect, and the defects that a traditional radar stealth coating cannot be compatible with the infrared stealth function, and the wave absorbing performance is not ideal are overcome; and the preparation method is simple and relatively mature, and is easy for large-scale production and application.

Description

technical field [0001] The invention belongs to the field of high-temperature stealth materials, and in particular relates to a high-temperature resistant radar and infrared compatible stealth coating and a preparation method thereof. Background technique [0002] Stealth technology is a method that uses various technical means to change or reduce the detectable information characteristics of the target, so as to minimize or reduce the probability of being discovered by the opponent's detection system, thereby improving the survival and penetration capabilities of the target. Generally, stealth technology is mainly divided into two categories: shape stealth technology and stealth material technology. Stealth material technology is relatively easy and has little impact on the target's shape, aerodynamics, and strength performance. However, with the rapid development of multi-spectral detection technology, a single stealth technology can no longer meet the application requirem...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B05D7/14B05D3/12B05D7/00B05D7/24
CPCB05D3/12B05D7/14B05D7/24B05D7/58
Inventor 黄文质刘海韬
Owner NAT UNIV OF DEFENSE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products