A kind of magnetron sputtering optical coating equipment and coating method with vacuum mechanical arm

Abstract

The invention discloses a magnetron sputtering optical coating device with a vacuum mechanical arm and a coating method. The magnetron sputtering optical coating device comprises a vacuum coating chamber, a vacuum mechanical arm chamber, magnetron sputtering target assemblies and a vertical rotating drum, wherein a connector connected with the vacuum mechanical arm chamber is formed in the side wall of the vacuum coating chamber; the vertical rotating drum rotates around the vertical axis; a seal box is arranged at the center of the vertical rotating drum; the plurality of magnetron sputteringtarget assemblies are arranged on the side wall of the vacuum coating chamber on the periphery of the vertical rotating drum; the vacuum mechanical arm is arranged in the vacuum mechanical arm chamber; and the vacuum mechanical arm horizontally and vertically moves in the vacuum state. The coating method comprises the steps of vacuumizing the coating device, rotating the vertical rotating drum till the vertical rotating drum reaches set rotation speed, starting a radio-frequency ion source, alternately coating film layers of two materials according to technological requirements, clamping a substrate with a chip on the vertical rotating drum through the vacuum mechanical arm, and taking the coated substrate down from the vertical rotating drum.

Description

technical field [0001] The invention belongs to the field of vacuum equipment, and in particular relates to a magnetron sputtering optical coating device with a vacuum mechanical arm and a magnetron sputtering optical coating method applied in the field of optical and electronic devices. Background technique [0002] At present, the main coating equipment for optics and other high-thickness requirements is mainly vacuum evaporation coating. With the development of electronic equipment such as mobile phones, it is required not only high control precision of the film system, but also high production capacity and low cost. Magnetron sputtering optical coating equipment and magnetron sputtering optical coating methods have also appeared on the market, basically all of which are used in coating equipment and coating methods for decoration or molds, or for functional magnetron sputtering in solar or display devices. All of these films do not require precise control of film thickne...

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Problems solved by technology

Magnetron sputtering optical coating equipment and magnetron sputtering optical coating methods have also appeared on the market, basically all of which are used in coating equipment and coating methods for decoration or molds, or for functional magnetron sputtering in solar or display devices. All of these films do not require precise control of film thickness, and there are few coatings; because the magnetron sputtering optical coating used in the field of optical and electronic devices is to precisely control the coating of multi-layer films under high-speed rotation, the highest coating needs Hundreds of layers of film achieve optical purposes by controlling the passage or reflection of light of different wavelengths; although there are technologies that can be coated with optical films, there are two major problems. The first is that the thickness of the coating cannot be monitored and controlled. Control the time and indirectly control the film thickness; secondly, only oxide targets can be used to directly coat metal oxides. Such targets have extremely low coating efficiency and are not suitable for mass production; therefore, it is necessary to develop magnetic materials suitable for mobile phones and other electronic equipment applications. Sputtering optical coating equipment and vacuum magnetron sputtering coating method applied in optical field

[0003] In the prior art, the vacuum magnetron sputtering coating equipment is single-chamber, and the vacuum needs to be broken every time, which not only affects the output, but when the gas is amplified, the surface of the magnetron sputtering target will absorb water vapor and undergo an oxidation reaction. Cause the pollution of magnetron sputtering target, have a strong impact on the performance of product and the consistency of product; For this reason the present invention has designed the magnetron sputtering optical coating equipment with the vacuum manipulator arm that does not destroy vacuum and finishes loading and unloading substrate and realized continuous Coating method; in order to improve the control accuracy of the coating thickness, the present invention is also provided with a crystal vibration film thickness measuring device

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