Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Chiral poly-schiff base cobalt salt composite wave-absorbing material

A technology of composite absorbing material and Schiff base cobalt salt, which is applied in the field of absorbing materials to achieve the effects of small specific gravity, wide absorbing frequency and preventing volatilization

Active Publication Date: 2018-07-20
NANCHANG HANGKONG UNIVERSITY
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] "A ferrocene-based chiral poly-Schiff base salt / graphene composite wave-absorbing material" (CN201510482592.X), "a ferrocene-based chiral poly-Schiff base salt / graphene" authorized by the applicant Composite absorbing material" (CN201510466074.9) two patents, compared with other composite absorbing materials, the prepared composite absorbing material has strong absorbing performance, absorbing frequency bandwidth, density, thickness and performance stability, etc. There are major improvements, but there is still room for improvement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] (1) Dissolve 0.04 mol of ferrocene formaldehyde in 80 ml of methanol, and raise the temperature to 45° C. under reflux to obtain a ferrocene formaldehyde methanol solution.

[0026] (2) Dissolve 0.02mol of chiral (R,R)-1,2-diphenylethylenediamine in 40ml of methanol, and then dissolve chiral (R,R)-1,2-diphenylethylenediamine The methanol solution was slowly dropped into the ferrocene formaldehyde methanol solution. After the drop was completed within 25 minutes, the solution was stirred and refluxed under nitrogen protection at 45°C for 6 hours to obtain solution A.

[0027] (3) The solution A was filtered, and the resulting filter cake was vacuum-dried at 35° C. for 24 hours to obtain a chiral ferrocenyl bis-Schiff base.

[0028] (4) Dissolve 0.1 mol of aluminum trichloride in 60 ml of chloroform, and drop into 12 ml of chloroform solution containing 0.01 mol of sebacoyl chloride to obtain solution B.

[0029] (5) Dissolve 0.01mol of chiral ferrocenyl bis-Schiff base ...

Embodiment 2

[0038] (1) Dissolve 0.06 mol of ferrocene formaldehyde in 60 ml of methanol, and raise the temperature to 45° C. under reflux to obtain a methanol solution of ferrocene formaldehyde.

[0039] (2) Dissolve 0.03mol of chiral (R)-(+)-2,2-diamino-1,1-binaphthyl in 30ml of methanol, and then dissolve chiral (R)-(+)-2,2 -Diamino-1,1-binaphthyl methanol solution was slowly dropped into the ferrocene formaldehyde methanol solution. After the drop was completed within 25 minutes, the mixture was stirred and refluxed under nitrogen protection at 45°C for 6 hours to obtain solution A.

[0040] (3) The solution A was filtered, and the resulting filter cake was vacuum-dried at 35° C. for 24 hours to obtain a chiral ferrocenyl bis-Schiff base.

[0041] (4) Dissolve 0.2 mol of aluminum trichloride in 120 ml of chloroform, and drop into 20 ml of chloroform solution containing 0.02 mol of sebacoyl chloride to obtain solution B.

[0042] (5) Dissolve 0.02mol of chiral ferrocenyl bis-Schiff bas...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a chiral poly-schiff base cobalt salt composite wave-absorbing material. The chiral poly-schiff base cobalt salt composite wave-absorbing material is prepared by preparing chiral poly-schiff base cobalt salt by a solvothermal method; compounding the chiral poly-schiff base cobalt salt with graphene; finally, adding a paraffin substrate. The chiral poly-schiff base cobalt salt and the overall composite material are in the mass ratio of (7.5 to 8.57) to 10; the graphene and the overall composite material are in the mass ratio of (1.43 to 2.5) to 10; the paraffin substrateand the overall composite material are in the mass ratio of 7 to 10. The chiral poly-schiff base cobalt salt composite wave-absorbing material is simple in preparation process, is low in density, high in wave absorbing capacity and wide in wave absorbing frequency band, and has a broad application prospect in the aspects, such as invisibility, electromagnetic radiation resistance, electromagneticshielding and the like.

Description

technical field [0001] The invention relates to a chiral poly-Schiff base cobalt salt composite wave-absorbing material, which relates to an electromagnetic wave composite wave-absorbing material, in particular to a radar stealth composite material, and specifically belongs to the technical field of wave-absorbing materials. Background technique [0002] Absorbing material refers to a type of material that can absorb electromagnetic waves projected onto its surface and convert the energy of electromagnetic waves into electrical energy or other forms of energy through the unique properties of the material. The absorbing material generally has a high absorption rate per unit thickness and light weight. Frequency bandwidth and stable performance in the environment in which it is used. Commonly used absorbing materials mainly include: ferrite, conductive polymer, carbon black, polycrystalline iron fiber, etc. At present, traditional stealth coatings at home and abroad still foc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08L91/06C08L79/04C08K3/04C08G73/06C09K3/00
CPCC08G73/0644C08G73/065C08L91/06C09K3/00C08L79/04C08K3/04
Inventor 王靳一然刘崇波张祥李琳吴铭魏鑫唐维露
Owner NANCHANG HANGKONG UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com