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Method for researching influence on formation of surface microstructure on basis of irradiating different materials by laser

A technology of laser irradiation and microstructure, which is applied in the direction of material analysis, material analysis, and measuring devices through optical means, can solve the problems of research methods without surface convex molding, and achieve easy control, short processing cycle, and easy operation. easy effect

Inactive Publication Date: 2018-07-24
HANGZHOU DIANZI UNIV
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Problems solved by technology

[0005] However, there is currently no research method based on the phase field model for the formation of protrusions on the surface of different materials.

Method used

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  • Method for researching influence on formation of surface microstructure on basis of irradiating different materials by laser
  • Method for researching influence on formation of surface microstructure on basis of irradiating different materials by laser
  • Method for researching influence on formation of surface microstructure on basis of irradiating different materials by laser

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Embodiment Construction

[0037] In order to make the objects, features and advantages of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that the drawings are in simplified form and use inaccurate scales, and are only used for the purpose of conveniently and clearly illustrating the embodiments of the present invention.

[0038] build as figure 1 The experimental equipment shown includes a test bench 1, a femtosecond laser transmitter 2, and a clamping plate 3 for a silicon substrate. The clamping plate 3 is equivalent to a clamping facility with a dimensional structure, and is used to clamp a silicon substrate 4 on the micron scale. The thermal diffusion affects the experimental results, and the thermal insulation material is selected. The experimental bench 1 is used to fix the femtosecond laser emitter 1 and the silicon substrate clamping plate 3 , and can ad...

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Abstract

The invention relates to a method for researching influence on formation of a surface microstructure on the basis of irradiating different materials by laser. The method comprises the following steps:irradiating a silicon substrate by utilizing femtosecond laser and enabling the silicon substrate to form surface bulges; 2, based on phase field model theory, establishing a mathematic model and performing simulated analysis on a silicon substrate bulge forming experiment; 3, selecting other material substrates with different heat-conducting coefficients and repeating the step 1 and the step 2 to obtain the bulge forming rules of different material substrates. The silicon substrate is irradiated by the femtosecond laser to form surface bulges, and the laser forming silicon-based surface formis simulated and predicted by using a three-dimensional numerical model, namely a phase field method, so that invention thought whether the bulges formed by irradiating other materials by the femtosecond laser accords with the same forming rule or not is provided.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and in particular relates to a research method for using a femtosecond laser to control the formation of protrusions on the surface of silicon substrates and other materials. Background technique [0002] Micromechanical resonators manufactured based on micro-nano structure processing and manufacturing technology are very important resonators, which have a series of advantages such as low cost, low power consumption, high sensitivity and resolution, and are widely used in acceleration sensors, low-light Electromechanical systems, wireless communications and micro-mechanical gyroscopes and other technical fields. [0003] Silicon is an important material for the manufacture of various silicon micromechanical resonators, and its growing importance is underscored by the diversity of its forming techniques. A three-dimensional microstructure with a size of micronano scale is manufac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/84B82Y35/00B82Y40/00
CPCB82Y35/00B82Y40/00G01N21/84
Inventor 张俐楠郭子望吴立群王洪成程从秀
Owner HANGZHOU DIANZI UNIV
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