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A system and method for making meter-scale gratings

A meter-scale, grating technology, applied in the field of scanning exposure and wide-beam scanning exposure for the preparation of meter-scale gratings, can solve the problems of poor timeliness, failure of scanning exposure, and decreased contrast of scanning fringes, and achieve the effect of less environmental factors.

Active Publication Date: 2019-12-27
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the poor timeliness caused by the long exposure time of the meter-level grating in the prior art and the environmental uncertainty leading to a decrease in the contrast of the scanning fringes, resulting in the failure of the entire scanning exposure

Method used

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  • A system and method for making meter-scale gratings
  • A system and method for making meter-scale gratings
  • A system and method for making meter-scale gratings

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Experimental program
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Embodiment 1

[0029] A system for fabricating meter-scale gratings, as attached figure 1 Shown: including laser 1, beam splitting prism 2, half-wave plate 3, first to third mirrors 4-6, first to second acousto-optic modulators 7-8, installed on a three-dimensional piezoelectric ceramic translation stage On the first spatial filter 9, the second spatial filter 10, the first to the second aspheric collimating lens 11-12, the first to the second beam shaping compression cylinder system 13-14, the first to the second Optical shutters 15-16, wedge-shaped attenuation plate 17, parallel attenuation plate 18, first photodetector 19, photoresist grating substrate 20, photoresist edge reference grating substrate 21, movable exposure platform 22, HeNe laser 23 , self-collimation beam expander system 24, the fourth mirror 25, the second photodetector 26;

[0030] The first spatial filter and the second spatial filter are respectively composed of a converging lens and a pinhole filter for modulating th...

Embodiment 2

[0045] A method of making a meter-level grating based on the above-mentioned system for making a meter-level grating,

[0046] Step 1, making photoresist edge reference grating: as attached figure 1 In the position shown, block the photoresist grating substrate with a light-shielding plate, move the movable exposure platform so that the interference fringes formed by the first exposure beam and the second exposure beam are located on the photoresist side reference grating substrate, and rest the stage for a while, Start to expose the photoresist edge reference grating substrate, remove the photoresist edge reference grating substrate, develop, clean and dry, and form the photoresist edge reference grating; reset in the original optical path, the first exposure beam and the second exposure beam The formed real-time interference fringes overlap with the photoresist edge reference grating (the fringes of the photosensitive material after development) to generate moiré fringes. Ad...

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Abstract

The invention belongs to the field of information optics, relates to a broad beam scanning exposure system and method, and solves the problems of poor timeliness caused by too long exposure time in manufacturing of a meter scale grating and the decreased contrast ratio of a scanning strip caused by the indeterminacy of the environment. An interference fringe scanning technique is used to seamlessly splice the grating continuously; a multi-dimensional strip locking technique is used in the process of scanning exposure, a latent image strip of a scanned and exposed latent image grating is takenas a locking strip all the time until the scanning exposure is finished; the phase difference of a first exposure beam and a second exposure beam, the strip cycle, the included angle between the firstexposure beam and the second exposure beam are locked in a real-time closed loop way in the process of mobile exposure, so that the seamless spliced meter scale grating which is high in quality and less affected by the environment factor is acquired within one scanning cycle; the use of a beam shaping compression cylinder surface system effectively increases the use ratio of the beam, meanwhile,the quality of a wave surface of the beam is guaranteed at the same time, and the preparation method of the meter scale grating is greatly shortened.

Description

technical field [0001] The invention belongs to the field of information optics and relates to a wide-beam scanning exposure method, in particular to a scanning exposure method for preparing meter-scale gratings. Background technique [0002] Grating is an important diffractive optical element, which is widely used in high-end technology fields such as various spectrometers, precision metrology (grating ruler), optical communication, astronomy and strong laser systems. At present, the main methods for preparing meter-scale gratings are: single exposure method, sub-grating exposure splicing method and scanning exposure method. At present, these three methods all use a single longitudinal mode laser (high-quality Gaussian spot) as the recording light source, and the power of the laser is about 1W, which limits the light intensity of the recording light. A large aperture beam is required to make a meter-scale grating. At this time, the luminous flux per unit area is very weak,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 邹文龙李朝明吴建宏陈新荣蔡志坚刘全周建康
Owner SUZHOU UNIV