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Pre-sputtering substrate and manufacturing method thereof

A production method and pre-sputtering technology, applied in the field of sputtering, can solve the problems of debris, time-consuming dummy process, and reduced production efficiency.

Inactive Publication Date: 2018-07-31
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Among them, since the coating on the dummy glass has a certain thickness (corresponding process thickness), the next one needs to be replaced, and the replacement takes time, resulting in a long time-consuming dummy process. Therefore, in the prior art, in order to reduce the usage of dummy glass, to reduce Cost and improve production efficiency, as mentioned above, before sputtering dummy glass, usually use pre-sputtering tray (Dummy Tray) equipment for sputtering (to consume the oxide layer or other impurity components on the surface of the target); Nevertheless, the number of dummy glasses used in the prior art is still as high as dozens or even hundreds of sheets. Among them, after pre-sputtering film formation, the film on the surface of the dummy glass needs to be removed by etching for circulation. use
[0004] However, in the recycling of dummy glass, if the number of cycles of dummy glass is too small, it will lead to an increase in production costs; if the number of cycles of dummy glass is too large, stress concentration will occur on the dummy glass due to repeated acid-base etching Or problems such as structural changes can easily lead to fragmentation of the dummy glass in the vacuum chamber, resulting in a reduction in production efficiency and a further increase in production costs

Method used

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  • Pre-sputtering substrate and manufacturing method thereof

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Embodiment Construction

[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0025] An embodiment of the present invention provides a pre-sputtering substrate. On the one hand, the main substrate of the pre-sputtering substrate is mainly formed of alumina and / or zirconium silicide materials, which can make the pre-sputtering substrate have the electrical properties of ordinary glass, It also has high melting point, high strength and strong heat resistance, and will not produce stress concentration or structural change (deformation, dime...

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Abstract

The invention provides a pre-sputtering substrate and a manufacturing method thereof. The pre-sputtering substrate comprises a main substrate mainly made of an aluminum oxide and / or zirconium silicidematerial; a sputtering side surface of the main substrate is a concave-convex absorption surface with a concave-convex surface; and / or, a middle layer and a meltallizing layer are arranged on the sputtering side surface of the main substrate in sequence, wherein the surface roughness of the middle layer is higher than or equal to 3 microns.

Description

technical field [0001] The invention relates to the field of sputtering, in particular to a pre-sputtering substrate and a manufacturing method thereof. Background technique [0002] PVD (Physical Vapor Deposition, physical vapor deposition) technology is used as a common deposition thin film (film formation) process in the production process of electronic products. A pre-sputtering (Dummy) process is required. Specifically, the Dummy process completes the process debugging by sputtering and forming a film on the glass used for pre-sputtering (Dummy glass, which can also be called a dummy substrate, white glass, etc.), so that the vacuum degree of the equipment, gas composition, and gas flow rate After the internal environment and related process parameters meet the process requirements, normal product production can be carried out. If there are impurities such as oxide layer on the surface of the target, the pre-sputtering tray (Dummy Tray) equipment is often used for spu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/08
CPCC23C14/025C23C14/028C23C14/0682C23C14/081
Inventor 房伟华张勋泽焦东晟肖亮王效坤蔡登刚段龙龙王健常浩张文俊李立曹金要
Owner BOE TECH GRP CO LTD
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