A kind of method for making nano silver wire transparent conductive film have the function of eliminating shadow

Abstract

The invention discloses a method for making a silver nanowire transparent conductive film have a shadow elimination function. The method includes the step of setting a functional layer between a substrate and a silver nanowire transparent conductive layer, wherein the functional layer is obtained by coating a functional layer paste on the surface of the substrate and performing film formation, andthe haze difference between the functional layer and the silver nanowire transparent conductive layer is less than 0.1, so that the purpose of shadow elimination can be achieved. According to the scheme of the invention, through the mode of adding the functional layer between the substrate and the conductive layer, the silver nanowire transparent conductive film can have the shadow elimination function, etching marks on the edges of an electrode region and a non-electrode region completely disappear, and the method is simple and convenient to operate, has the advantages of high yield and highreliability, is suitable for industrial production, and also has universality.

Description

technical field [0001] The invention relates to the field of display, in particular to a method for making a nano-silver wire transparent conductive film have an erasing function, and the nano-silver wire transparent conductive film prepared by the method is particularly suitable for use on optical glass, transparent flexible substrates and solar panels. Background technique [0002] Transparent conductive film is an important optical device in the display field, and ITO transparent conductive film is currently the most widely used. However, the ITO transparent conductive film has disadvantages such as poor bending performance and cannot be used for highly flexible devices, high square resistance cannot prepare large-scale display devices with high sensitivity, and complex vacuum sputtering process for film preparation. Therefore, in recent years, relevant scientific researchers have successively developed nanometer Metal conductive film, carbon nanotube conductive film, gra...

AI Technical Summary

Problems solved by technology

The vanishing etching of the above four patents all use the half-etching method, and there are still nanometer metal ions in the non-electrode area, and the functional reliability needs to be verified by the market. Excessive etching will lead to the appearance of etching marks, which will not achieve the purpose of erasing; at the same time, the etching paste needs to be screen printed, and the printing accuracy of screen printing is low for fine wire diameters

Patent US 20150362822 A1 proposes a method of using nano-ZnO to coat the surface of the silver wire layer. Through the high light transmittance and low diffuse reflection of nano-ZnO, the light transmittance of the electrode area is improved and the haze of the electrode area is reduced, thereby reducing the electrode area. The contrast between the electrode area and the non-electrode area is used to achieve the purpose of erasing, but this method cannot improve the optical performance of the electrode area to be similar to that of the substrate, so this method can only reduce the contrast, but cannot completely eliminate the etching mark. ;

Images