Test method for equivalent evaluation of ionization damage of heterogeneous radiation sources for bipolar devices
An ionization damage, bipolar device technology, applied in instruments, electrical digital data processing, computing, etc., can solve problems such as increased leakage current, decreased minority carrier lifetime, increased surface recombination rate, etc., to achieve wide application prospects and reduce costs. , easy to operate effect
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[0021] Specific implementation mode one: combine Figure 1 to Figure 4 To illustrate this embodiment, the equivalent evaluation test method for ionization damage of heterogeneous radiation sources for bipolar devices described in this embodiment includes the following steps:
[0022] Step 1. Determine the bipolar transistor SiO2 2 Layer thickness range, SiO 2 The shortest distance between the layer and the upper surface of the chip is t 1 , SiO 2 The farthest distance between the layer and the upper surface of the chip is t 2 , SiO 2 The thickness of the layer is t 2 -t 1 ;
[0023] Step 2. Calculate and select an electron or Co-60 source of a certain energy based on the Monte Carlo method, and ensure that the energy can make the range of electrons in the bipolar transistor not less than 5t 2 ;
[0024] Step 3: Carry out an irradiation test based on electrons or Co-60 sources of this energy, and in-situ test the relationship between the typical electrical performance ...
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