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An electrochromic film for effectively modulating sunlight transmittance and its preparation method

An electrochromic and effective modulation technology, applied in coatings and other directions, can solve problems such as narrow band range and inability to realize independent regulation of near-infrared radiation heat, and achieve significant practical effects

Inactive Publication Date: 2021-04-06
XIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide an electrochromic film that can effectively modulate the transmittance of sunlight, and solve the problems that commercial electrochromic films can adjust the narrow band range and cannot realize independent control of near-infrared radiant heat

Method used

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Examples

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Effect test

preparation example Construction

[0024] The present invention also provides a method for preparing an electrochromic thin film that effectively modulates sunlight transmittance, and the specific steps are as follows:

[0025] Step 1, preparing photosensitive tungsten oxide sol A and Cs-doped tungsten oxide photosensitive sol B;

[0026] Step 1.1, WCl 6 Mix with absolute ethanol at room temperature and stir for 2 hours to obtain a yellow tungsten oxide sol. Then, add a certain amount of 2,2-pyridine to the sol and reflux at 45-60°C for 2 hours to obtain photosensitive tungsten oxide sol. Tungsten sol A;

[0027] Step 1.2, adding a certain amount of CsCl to the photosensitive tungsten oxide sol A prepared in step 1.1, and stirring at 60° C. for 10 hours to obtain Cs-doped tungsten oxide photosensitive sol B;

[0028] In step 1, WCl 6 , absolute ethanol, 2,2-pyridine, and CsCl in a molar ratio of 1:30:1:(0.06~0.2);

[0029] Step 2, using spin coating technology to apply sol B on a transparent conductive coat...

Embodiment 1

[0039] An electrochromic film that effectively modulates sunlight transmittance is a Cs x WO 3A nano-lattice-embedded amorphous tungsten oxide composite film, wherein x=0.06, the nano-grid diameter is 80nm, the grid-dot spacing is 200nm, and the grid-dot height is 30nm.

[0040] The preparation method with the above structural parameters, the specific steps are as follows:

[0041] First, undoped tungsten oxide sol A and Cs-doped tungsten oxide sol B were respectively prepared. The process is as follows:

[0042] 4gWCl 6 Mix with 13.83g of absolute ethanol at room temperature, stir for 2 hours, then add 1.56g of 2,2-pyridine to the sol, and reflux at 45°C for 2 hours to obtain photosensitive tungsten oxide sol A.

[0043] Add 0.1 g of CsCl to photosensitive tungsten oxide sol A, and stir at 60° C. for 10 hours to obtain Cs-doped tungsten oxide photosensitive sol B.

[0044] Secondly, the sol B was coated on the transparent conductive coated glass substrate by spin coating...

Embodiment 2

[0050] An electrochromic film that effectively modulates sunlight transmittance is a Cs x WO 3 A nano-lattice-embedded amorphous tungsten oxide composite film, wherein x=0.2, the nano-grid diameter is 300nm, the grid-dot spacing is 600nm, and the grid-dot height is 80nm.

[0051] The preparation method with the above structural parameters, the specific steps are as follows:

[0052] First, undoped tungsten oxide sol A and Cs-doped tungsten oxide sol B were respectively prepared. The process is as follows:

[0053] 4gWCl 6 Mix with 13.83g of absolute ethanol at room temperature, stir for 2 hours, then add 1.56g of 2,2-pyridine to the sol, and reflux at 60°C for 2 hours to obtain photosensitive tungsten oxide sol A.

[0054] Add 0.34 g of CsCl to the photosensitive tungsten oxide sol A, and stir at 60° C. for 10 hours to obtain Cs-doped tungsten oxide photosensitive sol B.

[0055] Secondly, the sol B was coated on the transparent conductive coated glass substrate by spin c...

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Abstract

The invention discloses an electrochromic film for effectively modulating sunlight transmittance. The electrochromic film contains Cs x WO 3 A nano-lattice embedded amorphous tungsten oxide composite film, wherein x is 0.06-0.2, the grid point diameter is 80-300nm, the distance between adjacent grid points is 200-600nm, and the grid point height is 30-80nm. The thin film solves the problems that the commercial electrochromic thin film has a narrow adjustable wavelength range of sunlight and cannot independently adjust near-infrared radiant heat. The preparation method first uses laser interference combined with photosensitive sol-gel method to prepare Cs x WO 3 The nano lattice is then filled with an amorphous tungsten oxide matrix in the gaps of the lattice by a sol-gel method to form a composite film. The preparation method has the characteristics of controllable process and large-area film formation, and is very suitable for industrialized mass production.

Description

technical field [0001] The invention belongs to the technical field of preparation methods of transparent semiconductor films, and in particular relates to an electrochromic film for effectively modulating sunlight transmittance; the invention also relates to a preparation method of the electrochromic film for effectively modulating sunlight transmittance. Background technique [0002] Electrochromic thin films have great application potential in the field of architectural energy-saving coated glass due to their dynamic adjustability of solar light transmittance. The solar spectrum is a continuous spectrum composed of different wavelengths, from 200 to 2500nm, covering ultraviolet, visible and near-infrared light regions. Among them, the radiant energy in the ultraviolet light region, visible light region, and near-infrared light region accounted for 4%, 43% and 53% respectively. The electrochromic film fully absorbs ultraviolet light. The electrochromic band generally refe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/34
CPCC03C17/006C03C17/34C03C2217/42C03C2218/116
Inventor 任洋周晓歌赵高扬高赟赵沛淋
Owner XIAN UNIV OF TECH
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