Method and device for adjusting frequency of filter, and filter chip
A filter and frequency technology, applied in the direction of electrical components, impedance networks, etc., can solve the problems of small correction range, large filter center frequency distribution, complex process, etc.
Pending Publication Date: 2018-09-25
XIAMEN SANAN INTEGRATED CIRCUIT
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Problems solved by technology
The limitation of this method is that it can only be adjusted uniformly for all filter units on one filter chip, and the thickness of the dielectric layer on all filter units in the modified filter chip is the same , the correction range is very small, and the center frequency distribution of the final filter is too large
The limitation of this method is that it can only be uniformly adjusted for the filter units in a certain area on a filter chip, and the thickness of the dielectric layer on all the filter units in this area is the same after correction , the range of correction is still not large enough, and the center frequency distribution of the final filter is still too large
Moreover, this method needs to be carried out in a vacuum environment, and the process is relatively complicated.
Moreover, after each correction, frequency detection is required, and correction is performed again after the detection, until a satisfactory center frequency is obtained, and the production steps are also very cumbersome
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[0026] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0027] refer to figure 1 , a method of adjusting the frequency of the filter, using the absorption coefficient of the dielectric material on the surface of each filter unit for different wavelengths, selecting the corresponding wavelength of laser light, laser output power, laser spot diameter and laser irradiation time, so that the laser evaporates A certain weight of dielectric material, individually adjust the thickness of the dielectric material of each filter unit body on the filter, so as to individually adjust the frequency of each filter unit body. Since the method provided in this embodiment can adjust the frequency of each filter unit individually, the correction range of the filter frequency is greatly increased, and the method can continuously adjust the frequency of all filter units in the filter chip The frequency correction is carried ou...
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The invention provides a method and a device for adjusting the frequency of a filter, wherein the method comprises the steps of: selecting a laser of a corresponding wavelength, a laser output power,a laser spot diameter and a laser irradiation time by using absorption coefficients of the dielectric material on the surface of each filter unit body for different wavelengths, so that the laser evaporates a certain weight of the dielectric material; and separately adjusting the thickness of the dielectric material of each filter unit body on the filter to individually adjust the frequency of each filter unit body. The invention provides a filter chip including a piezoelectric material substrate and a plurality of filter unit bodies arranged on the substrate, wherein surfaces of the filter unit bodies have a layer of dielectric layer respectively, and the thicknesses of the dielectric layers of the plurality of filter unit bodies vary.
Description
technical field [0001] The invention relates to a filter, in particular to a method and a device for adjusting the frequency of the filter. Background technique [0002] In the prior art, in order to adjust the frequency of the filter, there are generally two methods: [0003] 1. Irradiate the entire filter chip with an electron or ion source, and use an electron or ion source to reduce the thickness of the dielectric layer of the filter chip. The limitation of this method is that it can only be adjusted uniformly for all filter units on one filter chip, and the thickness of the dielectric layer on all filter units in the modified filter chip is the same , the correction range is very small, and the center frequency distribution of the final filter is too large. Moreover, the method needs to be carried out in a vacuum environment, and the process is relatively complicated. Moreover, after each correction, frequency detection is required, and after the detection, correctio...
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IPC IPC(8): H03H3/04
CPCH03H3/04H03H2003/0421
Inventor 谢祥政杨浚哲尚荣耀朱庆芳蔡文必
Owner XIAMEN SANAN INTEGRATED CIRCUIT