A Variable Stiffness Vibration Isolator Based on Multilayer Dielectric Elastomer Film

Abstract

The invention discloses a variable rigidity vibration isolator based on multi-layer dielectric elastomer films. The vibration isolator comprises a multi-layer dielectric elastomer film spring and a plurality of annular magnets. The multi-layer dielectric elastomer film spring is formed by overlapping the multi-layer dielectric elastomer films and multiple conductive electrodes, and the polaritiesof the adjacent conductive electrodes are opposite. The vibration isolator realizes the non-linear negative stiffness through non-linear restoring force generated by the mutually attracted annular magnets. By changing driving voltage applied to the conductive electrodes of the multi-layer dielectric elastomer film spring, the multi-layer dielectric elastomer film spring is made to provide the positive stiffness matched with the driving voltage. Quasi-zero stiffness nearby the working position is realized through combination of the negative stiffness and the negative stiffness, and the inherentfrequency of a vibration isolation system is effectively reduced. As the multi-layer dielectric elastomer film spring provides the positive stiffness for voltage adjustment and control, the defect that the stiffness adjustment and control capacity of a single-layer dielectric elastomer film is limited is overcome, the stiffness adjustable and controllable range is greatly expanded, and adjustmentand control over the stiffness is realized.

Description

technical field [0001] The invention relates to the technical field of vibration isolation, in particular to a variable stiffness vibration isolator based on a multilayer dielectric elastomer film. Background technique [0002] In engineering, the vibration of mechanical equipment is a kind of ubiquitous phenomenon and has been paid more and more attention by people. These vibrations will cause large deformation and stress far greater than the static working load, which will cause great trouble to the normal operation of mechanical equipment. For example, the vibration of the lithography machine will affect the processing accuracy and greatly reduce the yield of semiconductor chips, and the vibration of the microscope will greatly reduce the definition of imaging. In order to reduce this effect, an effective measure is to insert a vibration isolator between the vibration source and the vibrating body to achieve vibration isolation. However, when designing a vibration isola...

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Problems solved by technology

However, in the design of the vibration isolator, it is necessary to design the appropriate parameters of the vibration isolation device, otherwise the vibration isolation system will not only fail to isolate the vibration, but will amplify the excitation

When the excitation frequency is greater than the natural frequency of the vibration isolation system The traditional linear vibration isolator starts to play a role when the frequency is 2 times, but it is often difficult to achieve effective isolation for vibrations in the low frequency range

Since the vibration isolation frequency band of general linear vibration isolators is limited, in order to effectively suppress low-frequency vibrations, a method often used is to widen the vibration isolation frequency band by reducing the stiffness of the vibration isolation system, but reducing the vibration isolation system The stiffness will increase the static deformation and reduce the stability of the system

Although some vibration isolators can achieve high static stiffness and low dynamic stiffness near the equilibrium position, they cannot achieve active regulation of stiffness

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