Organic light-emitting diode with performance optimised by plasmon suppression
A light-emitting diode, plasma technology, applied in the direction of organic semiconductor devices, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of not completely eliminating losses and reducing the quality of organic laminates
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[0031] figure 1 The OLEDs (which are not drawn to scale) include from the bottom:
[0032] - The substrate SUB, which can be made of silicon or glass, for example.
[0033] - The bottom electrode EL1, made of AlCu alloy, is deposited (eg by physical vapor deposition - PVD) on top of the surface of the substrate. The electrodes are opaque and can be relatively thick (hundreds of nanometers, even microns).
[0034] - A buffer layer CT made of TiN with a thickness of about 10 nanometers, deposited for example by PVD, PECVD (Plasma Enhanced Chemical Vapor Deposition) or ALD (Atomic Layer Deposition).
[0035] - Organic stack EO, 100 nm thick, obtained for example by PVD or liquid phase deposition. In the center of the stack there is a light-emitting layer which exhibits an emission centered at a wavelength of 550 nanometers. The figure does not show this layer, but only the point emitter (one point of this layer) EP used in the calculations that allow optimization of the effic...
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