Disilane preparation device

Abstract

The embodiment of the invention provides a disilane preparation device which comprises a filtering unit, a first rectifying tower, a second rectifying tower and a reactor, wherein the first rectifyingtower is connected with the filtering unit, the second rectifying tower is connected with the first rectifying tower, and the reactor is connected with the second rectifying tower. According to the device disclosed by the embodiment of the invention, polycrystalline silicon residual liquid is utilized as a raw material, and high-purity disilane meeting semiconductor industry application can be prepared out.

Description

technical field [0001] The invention relates to a disilane preparation device, in particular to a preparation device capable of preparing high-purity disilane that meets the application requirements of the semiconductor industry. Background technique [0002] Disilane is mainly used in solar cells, photosensitive drums, amorphous silicon films, epitaxial growth, chemical vapor deposition, etc. When used as a deposition source, the deposition layer is silicon oxide or silicon nitride. Compared with silane, disilane has the characteristics of faster deposition rate and lower deposition temperature, which can prevent the formation of spherical protrusions in amorphous silicon and can improve the deposition rate. The uniformity is mainly used in the manufacture of high-end chips below 20 nanometers. [0003] In the production of solar cells, the deposition rate of disilane is much faster than that of silane on amorphous silicon wafers, and the temperature can be lowered by 200-...

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Problems solved by technology

Among them, the chlorodisilane reduction method is to prepare disilane by reducing chlorodisilane with complex metal hydrides such as lithium aluminum hydride or sodium aluminum hydride, but in this method, chlorodisilane needs to be synthesized separately, which is difficult to synthesize and low yield

[0005] The magnesium silicide and ammonium chloride reaction method is to react magnesium silicide and ammonium chloride to produce disilane, but the product in the process is mainly silane, and the proportion of disilane is only about 3%, which is recovered as a by-product, so the main Increasing disilane yield by controlling the yield of by-products limits the feasibility of the process to produce disilane as the main product

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