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ZnO composite transparent conductive thin film based on flexible substrate and preparation method thereof

A technology of transparent conductive film and flexible substrate, which is applied to conductive layers on insulating carriers, cable/conductor manufacturing, circuits, etc., can solve the problems of unfavorable transparent conductive film light transmittance, affecting the performance of final products, and high film cost. To meet the requirements of industrial production, to facilitate large-scale industrial preparation, and to achieve good repeatability

Inactive Publication Date: 2018-11-23
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, precious metal materials such as Au, Ag, Pt, etc. are commonly used in the middle conductive layer of composite transparent conductive films. The cost of noble metal films is high and resources are scarce and difficult to obtain, and the reflectivity of Au is very high, which is not conducive to maintaining transparent conductive films. The light transmittance, which affects the performance of the final product
Therefore, it is of great significance to develop a flexible ZnO composite transparent conductive film with excellent comprehensive performance, low raw material price, easy access, and convenient mass production, but it has not been reported in the prior art

Method used

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  • ZnO composite transparent conductive thin film based on flexible substrate and preparation method thereof
  • ZnO composite transparent conductive thin film based on flexible substrate and preparation method thereof
  • ZnO composite transparent conductive thin film based on flexible substrate and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0029] Choose flexible PET as the substrate, cut the raw material PET into square pieces with an area of ​​15 mm×15 mm, put the flexible PET substrate into deionized water and absolute ethanol for 10 min, and then take it out with a nitrogen gun Dry and set aside; place the flexible PET substrate on the sample stage of the magnetron sputtering coating apparatus, adjust the distance between the sample stage and the target to be 53 cm, replace the ZnO target (the purity of the ZnO target is 99.99%), cover and Tighten the bleed valve of the flange cover, turn on the vacuum pump switch and start the vacuum system to start pumping the air in the chamber. When the vacuum reaches 1 Pa or below, inject pure argon Ar (purity 99.999%) for about 5 minutes; The RF power is turned on, the sputtering power is adjusted to 100W, the sputtering pressure is 15 Pa, and the rotation speed of the sample stage is 12 r / min. After 2 minutes of pre-sputtering, the stopper is removed to deposit a bottom...

Embodiment 2

[0035] The bottom ZnO is the same as in Example 1, except that after sputtering the bottom ZnO, an Al target (the purity of the Al target is 99.995%) is replaced, the sputtering power is adjusted to 150W, the sputtering pressure is 15 Pa, and the sample stage speed is 4 r / min , after pre-sputtering, Al with a thickness of 6 nm was deposited on the surface of the bottom ZnO; in the same way, a Cu target was replaced (the purity of the Cu target was 99.995%), and the sputtering power was adjusted to 30W, the sputtering pressure was 15Pa, and the speed of the sample stage was 4 r / min, deposit Cu with a thickness of 2 nm on the surface of the Al layer after pre-sputtering; finally replace the ZnO target, adjust the sputtering power to 100W, sputtering pressure 15 Pa, sample stage speed 12 r / min, pre-sputtering Finally, a top layer of ZnO with a thickness of 50 nm is deposited on the surface of the Cu layer to obtain a flexible substrate-based ZnO / Cu 2 / Al 6 / ZnO composite transp...

Embodiment 3

[0039] The bottom ZnO is the same as in Example 1, the difference is that after sputtering the bottom ZnO, the Cu target (the purity of the Cu target is 99.995%) is replaced, the sputtering power is adjusted to 30W, the sputtering pressure is 15 Pa, and the speed of the sample stage is 4 r / min , after pre-sputtering, Cu with a thickness of 4 nm was deposited on the surface of the bottom ZnO; similarly, an Al target was replaced (the purity of the Al target was 99.995%), and the sputtering power was adjusted to 150W, the sputtering pressure was 15Pa, and the speed of the sample stage was 4 r / min, after pre-sputtering, deposit Al with a thickness of 4 nm on the surface of the Cu layer; finally replace the ZnO target, adjust the sputtering power to 100W, sputtering pressure 15 Pa, sample stage speed 12 r / min, pre-sputtering Then deposit a top layer of ZnO with a thickness of 50 nm on the surface of the Cu layer to obtain a flexible substrate-based ZnO / Al 4 / Cu 4 / ZnO composite ...

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Abstract

The invention relates to the field of conductive thin film materials and provides a ZnO composite transparent conductive thin film based on a flexible substrate and a preparation method thereof. At first, a bottom layer of ZnO, a middle metal layer consisting of method Al and metal Cu and a top layer of ZnO are sputtered on a flexible PET substrate by magnetron sputtering, then a ZnO composite transparent conductive thin film based on the flexible PET substrate is obtained. According to the invention, the ZnO composite transparent conductive thin film based on the flexible substrate ensures high light transmittance and electrical conductivity, and meanwhile, the raw material price is greatly reduced and is easier to obtain, the preparation method has the advantages of simple preparation, good controllability and low requirement for equipment operation, and can be widely used in industry.

Description

technical field [0001] The invention relates to the field of conductive film materials, in particular to a ZnO composite transparent conductive film based on a flexible substrate and a preparation method thereof. Background technique [0002] Transparent conductive film is a kind of film with special properties of optical properties and conductive properties; this particularity determines that it will become a new type of optoelectronic material with bright prospects and wide applications. With the advancement of material science, transparent conductive films have been widely used in contemporary emerging technology fields such as optoelectronics, sensors, microelectronics, liquid crystal displays, and solar cells. [0003] According to different types of substrates, transparent conductive films can be mainly divided into traditional hard substrates and new flexible substrates. With the development of light and thin electronic devices in recent years, transparent conductive ...

Claims

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Application Information

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IPC IPC(8): H01B1/08H01B5/14H01B13/00
CPCH01B1/08H01B5/14H01B13/00
Inventor 任乃飞王天宇
Owner JIANGSU UNIV
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