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High-temperature activation purifying method for quartz sand

A technology of high-temperature activation and purification method, applied in the direction of silicon oxide, silicon dioxide, etc., can solve the problems of insufficient reaction of quartz sand, environmental and personal harm, large chlorinating agent, etc., to improve product quality, reduce dosage, reaction Efficient effect

Active Publication Date: 2018-11-30
HUBEI FEILIHUA QUARTZ GLASS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages of high-temperature gasification and purification of quartz sand in the existing process are that the reaction of quartz sand is insufficient, the output is low, and a large amount of toxic chlorinating agent is used, which causes serious harm to the environment and people.

Method used

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  • High-temperature activation purifying method for quartz sand
  • High-temperature activation purifying method for quartz sand
  • High-temperature activation purifying method for quartz sand

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Firstly, the coarse quartz sand with a total impurity content of less than 50ppm, a particle size distribution of 100-240 mesh, and a median diameter of 130-170 mesh is screened as the raw material for activation and purification. The impurity content of the coarse quartz sand used in this example was detected by the ICP-OES method, and the detection data are shown in Table 1.

[0033] Table 1 Detection data of impurity content in coarse quartz sand

[0034]

[0035] Use hydrofluoric acid solution or hydrofluoric acid, hydrochloric acid and sulfuric acid with a concentration of 0.05 mol / L to soak and pickle the hearth 12 and furnace cover 8 of the high-temperature activation furnace to ensure the cleanliness of the hearth 12 environment. The pickling time is 10 minutes. After pickling, use high-purity water to rinse the hearth 12 and furnace cover 8 of the high-temperature activation furnace 3 for more than 2 minutes. The high-temperature activation device is compos...

Embodiment 2

[0045] Firstly, the coarse quartz sand with a total impurity content of less than 50ppm, a particle size distribution of 120-220 mesh, and a median diameter of 140-160 mesh is screened as the raw material for activation and purification. The impurity content of the coarse quartz sand used in this example was detected by the ICP-OES method, and the detection data are shown in Table 3.

[0046] Table 3 Detection data of impurity content in coarse quartz sand

[0047]

[0048] Use hydrofluoric acid solution or hydrofluoric acid, hydrochloric acid and sulfuric acid with a concentration of 0.04 mol / L to soak and pickle the hearth 12 and furnace cover 8 of the high-temperature activation furnace to ensure the cleanliness of the hearth 12 environment. The pickling time is 8 minutes. After pickling, use high-purity water to rinse the hearth 12 and furnace cover 8 of the high-temperature activation furnace 3 for more than 2 minutes. The high-temperature activation device is compose...

Embodiment 3

[0058] Firstly, screen the coarse quartz sand with a total impurity content of less than 50ppm, a particle size distribution of 130-200 mesh, and a median diameter of 140-150 mesh as the raw material for activation and purification. The impurity content of quartz coarse sand was detected by ICP-OES method, and the detection results are shown in Table 5.

[0059] Table 5 Detection data of impurities in quartz coarse sand raw materials

[0060]

[0061] Use hydrofluoric acid solution or hydrofluoric acid, hydrochloric acid and sulfuric acid with a concentration of 0.03 mol / L to soak and pickle the hearth 12 and furnace cover 8 of the high-temperature activation furnace to ensure the cleanliness of the hearth 12 environment. The pickling time is 7 minutes. After pickling, use high-purity water to rinse the hearth 12 and furnace cover 8 of the high-temperature activation furnace 3 for more than 2 minutes. The high-temperature activation device is composed of a gas control devi...

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Abstract

The invention relates to a high-temperature activation purifying method for quartz sand and belongs to the technical field of production of quartz glass. According to the activation purifying method disclosed by the invention, the quartz sand reacts with chlorination gas for 15 to 120 minutes in a sealed furnace hearth at the temperature of 950 DEG C to 1,450 DEG C under the condition of shaft-around swinging, so as to remove alkali-metal and alkaline-earth metal element impurities from the quartz sand. The quartz sand continuously turns over and flows in the sealed furnace hearth, so that theefficiency of chlorination is greatly increased, meanwhile, the consumption of the chlorination gas is reduced, and the production cost and environmental stress are reduced effectively. The problemsin the existing processes that a high-temperature gasified purification reaction of the quartz sand is insufficient and is low in yield, a large number of toxic chlorating agent is used, and severe hazards are caused to environments and human bodies are solved. According to the method, materials can be in full reaction, problems of hardening and caking do not occur easily, and thus, the method hasthe characteristics of high reaction efficiency, low environmental load and high coefficient of safety and has a positive popularization significance in improving product quality.

Description

Technical field [0001] The invention relates to a high-temperature activation and purification method of high-purity quartz sand and belongs to the technical field of quartz glass production. Background technique [0002] High-purity quartz sand is a high-purity non-metallic mineral raw material produced from natural quartz minerals through a series of physical and chemical purification technologies. It is the main material for the production of high-purity quartz glass. Quartz glass, as an important basic material due to its excellent high-temperature thermal stability, chemical stability, optical properties, electrical properties and strong mechanical properties, is widely used in electric light sources, semiconductors, photovoltaics, optical communications, laser technology, aerospace industries such as technology and military technology. [0003] The production process of high-purity quartz sand generally includes water quenching, magnetic separation, electric separatio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12
CPCC01B33/12C01P2002/80
Inventor 吴学民鲁志强刘志龙张国君商春利邓强
Owner HUBEI FEILIHUA QUARTZ GLASS
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