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Film coating equipment and method

A coating equipment and band-pass film technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems of low production efficiency of optical filters, and achieve the improvement of product stress, stable internal structure, Evenly attached effect

Active Publication Date: 2018-12-18
XINYANG SUNNY OPTICAL CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to provide a coating device and a coating method to solve the problem of low production efficiency of optical filters

Method used

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  • Film coating equipment and method
  • Film coating equipment and method

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Embodiment approach

[0045] According to one embodiment of the present invention, a kind of coating method of the present invention comprises:

[0046] S1. Install the sputtering target a and the substrate b in the vacuum chamber 1 respectively, and control the pressure in the vacuum chamber 1 to a preset pressure value. In this embodiment, the sputtering target a is installed on the target base 11 in the vacuum chamber 1. In this embodiment, the sputtering target a can be a silicon target or a niobium target, and of course it can also be Other materials, depending on the specific situation. The substrate b to be coated with a film layer is installed on the base fixture 12 . The position of the target base 11 is adjusted by controlling the linear displacement device on the target base 11 . Turn on the power supply of the pumping device 16, pump the vacuum chamber 1 through the pumping device 16, make the pressure value in the vacuum chamber 1 reach the preset pressure value, and stop the operati...

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Abstract

The invention relates to film coating equipment and method. The film coating equipment includes a vacuum chamber (1), an even number of target material bases (11), a substrate fixture (12) and an electrode switching device (13), wherein the target material bases (11) and the substrate fixture (12) are disposed in the vacuum chamber (1). The target material bases (11) are disposed above the substrate fixture (12). The electrode switching device (13) is connected with the target material bases (11). By alternately changing the electric polarity of sputtering target materials, positively chargedplasmas alternately bombards the sputtering target materials of which the electric polarity is the cathode in the film coating process, so that "poisoning" of the sputtering target materials due to long-time bombardment of the same sputtering target material is avoided, the failure of the sputtering target materials in the film coating process is avoided, the service life of the sputtering targetmaterials is effectively prolonged, and the film coating efficiency of the film coating equipment is further improved.

Description

technical field [0001] The invention relates to a coating device and a coating method, in particular to a coating device and a coating method for an optical filter. Background technique [0002] With the development of science and technology, face recognition and gesture recognition are gradually embedded in terminal applications such as smart phones, vehicle lidar, security access control, smart home, virtual reality / augmented reality / mixed reality, 3D somatosensory games, 3D cameras and displays. and other functions. Correspondingly, in order to realize the above functions, a near-infrared narrow-band filter is required, which can enhance the reflection of the near-infrared light in the copper strip and cut off the visible light in the environment. Usually near-infrared narrow-band filters include two film systems, namely IR band-pass film system and long-wave pass AR film system. Traditional film materials and vacuum evaporation coating methods are difficult to meet the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/46C23C14/06C23C14/08
CPCC23C14/0036C23C14/0652C23C14/083C23C14/352C23C14/46Y02P70/50
Inventor 陈策丁维红肖念恭陈吉利
Owner XINYANG SUNNY OPTICAL CO LTD
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